⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethylammonium SCHEMBL27531397 | 0.78 | — | — | |
| Trimethylammonium SCHEMBL20496147 | 0.72 | — | — | |
| Ethane SCHEMBL3974768 | 0.72 | — | — | |
| Ethane SCHEMBL28381153 | 0.72 | — | — | |
| Chloromethane SCHEMBL27867424 | 0.72 | — | — | |
| Trimethylammonium SCHEMBL13989274 | 0.71 | — | — | |
| Trimethylammonium SCHEMBL5582 | 0.71 | — | — | |
| Trimethylammonium SCHEMBL5310222 | 0.71 | — | — | |
| SCHEMBL7573200 | 0.71 | — | — | |
| SCHEMBL6892 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104609863-B | Silicon carbide fiber of appearance deposition SiBCN coating and preparation method thereof | National University of Defense Technology of People's Liberation Army of China (CN) | 2016-03-30 | — | — | CN | disclosed |
| CN-104609863-A | Silicon carbide fiber provided with SiBCN coating deposited on surface and preparation method of silicon carbide fiber | NAT UNIV DEFENSE TECHNOLOGY | 2015-05-13 | — | — | CN | disclosed |
| CN-102781947-B | Process for conversion of disilanes | WACKER CHEMIE AG | 2015-01-21 | — | — | CN | disclosed |
| CN-102124048-B | Method of producing anti-glare film | FUJIFILM CORP | 2013-08-07 | — | — | CN | disclosed |
| CN-102781947-A | Process for conversion of disilanes | WACKER CHEMIE AG | 2012-11-14 | — | — | CN | disclosed |
| CN-102124048-A | Method of producing anti-glare film | FUJIFILM CORP | 2011-07-13 | — | — | CN | disclosed |
| CN-100519651-C | Epoxy resin composition and semiconductor device | SUMITOMO BAKELITE CO (JP) | 2009-07-29 | — | — | CN | disclosed |
| CN-1984961-A | Epoxy resin composition and semiconductor device | SUMITOMO BAKELITE CO (JP) | 2007-06-20 | — | — | CN | disclosed |
| CN-1944493-A | Liquid organopolysiloxanes | WACKER CHEMIE AG (DE) | 2007-04-11 | — | — | CN | disclosed |
| US-4927616-A | Preparation of silane and amine alanes | ETHYL CORPORATION (US) | 1990-05-22 | — | — | US | disclosed |