SCHEMBL6892

SCHEMBL6892

Cl[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20455819 1.00
SCHEMBL7573200 1.00
SCHEMBL3912341 0.89
SCHEMBL829893 0.89
Ammonia Solution, Strong SCHEMBL2314527 0.89
SCHEMBL7745803 0.89
SCHEMBL2407786 0.89
SCHEMBL9741299 0.89
Hydrochloric Acid SCHEMBL2873631 0.89
SCHEMBL17350487 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 62238 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
EP-4749710-A1 SILICON-CARBON COMPOSITE MATERIAL CONTAINING CARBON NANOTUBES, AND PREPARATION METHOD THEREFOR AND USE THEREOF Tianmulake Excellent Anode Materials Co, Ltd. (CN) 2026-05-27 EP claimed
CN-122080063-A Phosphine oxide derivative based on [2.2] p-cycloaralkyl and synthetic method thereof 2026-05-26 CN claimed
CN-114695264-B Semiconductor memory structure and method for filling conductive material in contact hole INSTITUTE OF MICROELECTRONICS OF THE CHINESE ACADEMY OF SCIENCES (CN) 2026-05-26 CN claimed
CN-122079120-A Porous carbon, silicon-carbon anode material comprising porous carbon, and preparation method and application of porous carbon 2026-05-26 CN claimed
CN-224270187-U Carbon-containing chlorosilane impurity removal and chlorosilane recovery system XINTE ENERGY CO.,LTD. (CN) 2026-05-26 CN claimed
CN-117531220-B Trichlorosilane purification system in polycrystalline silicon production process XINJIANG DAQO NEW ENERGY CO.,LTD. (CN) 2026-05-26 CN claimed
CN-122078008-A High-strength wear-resistant composite fabric and preparation process thereof 2026-05-26 CN claimed
CN-122079170-A Method for removing boron and phosphorus impurities in high-purity trichlorosilane 2026-05-26 CN claimed
CN-122080062-A Phosphine oxyalkylthio substituted binaphthol derivative and synthesis method thereof 2026-05-26 CN claimed
US-4028384-A HYDROSILYLATION WITH A HYDROGEN SILANE, PLATINUM COMPLEX CATALYST DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) 1977-06-07 US claimed
US-4018871-A TO DICHLOROSILANE, N-SUBSTITUTED-A-PYRROLIDONE CATALYST RHONE-POULENC INDUSTRIES (FR) 1977-04-19 US claimed
US-4007050-A OR METALLOIDS DEUTSCHE GOLD- UND SILBER-SCHEIDEANSTALT VORMALS ROESSLER (DT) 1977-02-08 US claimed
US-3992322-A Preparation of polymerization catalyst systems UNIVERSAL OIL PRODUCTS COMPANY (US) 1976-11-16 US claimed
US-3990953-A REDUCTION OF SILICON HALIDE BATTELLE DEVELOPMENT CORPORATION (US) 1976-11-09 US claimed
US-3985781-A Esterification method for trichlorosilane DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) 1976-10-12 US claimed
US-3980686-A Process for the preparation of chlorosilane RHONE-POULENC INDUSTRIES (FR) 1976-09-14 US claimed
US-3959242-A MOLD RELEASE SURFACE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-05-25 US claimed
US-3935040-A Process for forming monolithic semiconductor display HARRIS CORPORATION (US) 1976-01-27 US claimed
US-3933985-A REDUCTION OF SILICON TETRAHALIDE MOTOROLA, INC. (US) 1976-01-20 US claimed