⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20455819 | 1.00 | — | — | |
| SCHEMBL6892 | 1.00 | — | — | |
| SCHEMBL3912341 | 0.89 | — | — | |
| SCHEMBL829893 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL2314527 | 0.89 | — | — | |
| SCHEMBL7745803 | 0.89 | — | — | |
| SCHEMBL2407786 | 0.89 | — | — | |
| SCHEMBL9741299 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL2873631 | 0.89 | — | — | |
| SCHEMBL17350487 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108950680-A | Extension pedestal and epitaxial device | 上海新昇半导体科技有限公司 | 2018-12-07 | — | — | CN | disclosed |
| CN-108862281-A | A kind of combine production method of rod-like polycrystal silicon and granular polycrystalline silicon | 亚洲硅业（青海）有限公司 | 2018-11-23 | — | — | CN | disclosed |
| CN-207581352-U | Hydrogen chloride gas processing unit | 鹤山市奋力达化工有限公司 | 2018-07-06 | — | — | CN | disclosed |
| CN-207294192-U | A kind of hydrogen plasma method silane synthetic tower | 许文 | 2018-05-01 | — | — | CN | disclosed |
| CN-107814357-A | Hydrogen chloride gas processing unit | 鹤山市奋力达化工有限公司 | 2018-03-20 | — | — | CN | disclosed |
| CN-105417544-B | The system and method for preparing polysilicon | 云南冶金云芯硅材股份有限公司 | 2017-12-05 | — | — | CN | disclosed |
| CN-107311183-A | A kind of method and device of hydrogen plasma method synthesizing silane | 许文 | 2017-11-03 | — | — | CN | disclosed |
| CN-104591187-B | A kind of production polysilicon method | 北京工业大学 | 2016-09-14 | — | — | CN | disclosed |
| CN-104192848-B | Trichlorosilane producing apparatus and manufacture method | 三菱综合材料株式会社 | 2016-07-27 | — | — | CN | disclosed |
| CN-105541895-A | Production method of gamma-chloropropyl trichlorosilane | ZIBO LINZI QIQUAN IND TRADE CO LTD | 2016-05-04 | — | — | CN | disclosed |
| CN-103708471-A | Equipment and method for preparing chlorosilane from silane through reverse disproportionation | UNIV TIANJIN | 2014-04-09 | — | — | CN | disclosed |
| CN-103482573-A | Method and device for drying hydrogen chloride gas in polysilicon production | TBEA XINJIANG NEW ENERGY CO LTD | 2014-01-01 | — | — | CN | disclosed |
| CN-102794070-A | Processing method for trichlorosilane gas | XINJIANG DAQO NEW ENERGY CO LTD | 2012-11-28 | — | — | CN | disclosed |
| CN-202453214-U | Trichlorosilane sampler | JIAOZUO COAL GROUP KAIYUAN CHEMICAL CO LTD | 2012-09-26 | — | — | CN | disclosed |
| CN-101497442-B | Method of preparing polysilicon | ZHONGSHENG SANG | 2012-07-04 | — | — | CN | disclosed |
| CN-202226675-U | Power starting device of reduction furnace | JIANGSU JINGDA SEMICONDUCTOR MATERIALS CO LTD | 2012-05-23 | — | — | CN | disclosed |
| CN-102390833-A | Method for recycling waste chlorosilane in polycrystalline silicon, produced by using modified Siemens process, under negative pressure | LESHAN LEDIAN TIANWEI SILICON TECHNOLOGY CO LTD | 2012-03-28 | — | — | CN | disclosed |
| CN-101497442-A | Method of preparing polysilicon | ZHONGSHENG SANG (CN) | 2009-08-05 | — | — | CN | disclosed |
| CN-200964389-Y | Device for continuously preparing halogen-free trialkoxyl silicane | DEGUSSA (DE) | 2007-10-24 | — | — | CN | disclosed |
| EP-0878477-B1 | Phosphorus removal from chlorosilane | DOW CORNING (US) | 2002-09-25 | — | — | EP | disclosed |