Methacrylic Acid

Methacrylic Acid

SCHEMBL10400412

C=C(C)C(=O)O.C=C(C)C(=O)O.CCCCCC(OCC1CO1)OCC1CO1

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
TDP1 Q9NUW8 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.38
SMPD1 P17405 3/20 0.36
ENPP2 Q13822 1/20 0.34
LPAR2 Q9HBW0 1/20 0.34
TSHR P16473 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL3041599 1.00 ALDH1A1 (0.45) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
Methacrylic Acid SCHEMBL6859961 0.90 ALDH1A1 (0.49) ALDH1A1TDP1SMN1; SMN2
Bicarbonate SCHEMBL17603243 0.90 ALDH1A1 (0.45) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL37928 0.85 ALDH1A1 (0.52) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL6563001 0.83 ALDH1A1 (0.55) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL2919761 0.83 ALDH1A1 (0.55) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL17102749 0.83 ALDH1A1 (0.55) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL9058587 0.83 ALDH1A1 (0.55) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL1002079 0.83 ALDH1A1 (0.55) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2
SCHEMBL7174552 0.81 ALDH1A1 (0.47) ALDH1A1TDP1SMN1; SMN2SMPD1ENPP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4940649-A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1990-07-10 US disclosed
US-4886735-A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1989-12-12 US disclosed