SCHEMBL10405155

SCHEMBL10405155

N#COS(=O)(=O)Cc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.55
PRSS1 P07477 3/20 0.47
PRSS2 P07478 3/20 0.47
PRSS3 P35030 3/20 0.47
CA1 P00915 3/20 0.47
CA2 P00918 3/20 0.47
CA9 Q16790 2/20 0.47
FAAH O00519 1/20 0.47
ELANE P08246 1/20 0.47
PRTN3 P24158 1/20 0.47
CA5A P35218 1/20 0.47
HTT P42858 1/20 0.44
MAPT P10636 1/20 0.43
F2 P00734 2/20 0.43
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP13 P45452 1/20 0.42
ALDH1A1 P00352 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17429334 0.81 CA12 (0.38) KMT2ACA1CA2CA9MAPT
SCHEMBL17429328 0.81 POLB (0.43) KMT2ACA1CA2CA9MAPT
SCHEMBL17429348 0.78 KIF11 (0.51) KMT2ACA1CA2CA9
SCHEMBL11747445 0.77 KMT2A (0.52) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL28869037 0.77 KMT2A (0.52) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL1972890 0.76 KMT2A (0.65) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL11074192 0.75 KMT2A (0.59) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL27300181 0.74 KMT2A (0.63) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL11438308 0.73 KMT2A (0.57) KMT2APRSS1PRSS2PRSS3CA1
SCHEMBL3936439 0.73 KMT2A (0.57) KMT2APRSS1PRSS2PRSS3CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0330406-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-08-30 EP claimed
US-9947965-B2 Nonaqueous electrolyte solution and nonaqueous electrolyte battery using same MITSUBISHI CHEMICAL CORPORATION (JP) 2018-04-17 US disclosed
US-20160013517-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY USING SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2016-01-14 US disclosed
US-4963463-A Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-10-16 US disclosed
EP-0330406-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-08-30 EP disclosed