⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26698974 | 0.97 | ALDH1A1 (0.46) | — | |
| SCHEMBL8062431 | 0.85 | ALDH1A1 (0.56) | — | |
| SCHEMBL12450480 | 0.84 | ALDH1A1 (0.39) | — | |
| SCHEMBL5115862 | 0.82 | — | — | |
| SCHEMBL19849087 | 0.82 | — | — | |
| SCHEMBL17520374 | 0.81 | ALDH1A1 (0.59) | — | |
| SCHEMBL14993556 | 0.81 | ALDH1A1 (0.50) | — | |
| SCHEMBL5117460 | 0.80 | ALDH1A1 (0.37) | — | |
| SCHEMBL1375496 | 0.78 | LMNA (0.39) | — | |
| SCHEMBL118991 | 0.77 | LMNA (0.61) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4217 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4746651-A1 | DISPERSION LIQUID, METHOD FOR PRODUCING QUANTUM DOT FILM, METHOD FOR PRODUCING LIGHT DETECTION ELEMENT, AND METHOD FOR PRODUCING IMAGE SENSOR | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | claimed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | claimed |
| CN-122025628-A | Lithium sulfide, preparation method thereof and solid-state battery | 湖北金泉新材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122010057-A | Liquid phase synthesis method of lithium sulfide, sulfide-based solid electrolyte and lithium ion battery | 湖北金泉新材料有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-20260125577-A1 | SELF-LUBRICATING POLYIMIDE VARNISH AND POLYIMIDE COATING PREPARED THEREFROM | PI ADVANCED MAT CO LTD (KR) | 2026-05-07 | — | — | US | claimed |
| US-12603290-B2 | Electrode binder slurry composition for lithium ion electrical storage devices | PPG INDUSTRIES OHIO, INC. (US) | 2026-04-14 | — | — | US | claimed |
| US-12600908-B2 | Etching solution and etching method for gold or gold alloy | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2026-04-14 | — | — | US | claimed |
| US-20260092194-A1 | POLYIMIDE VARNISH WITH IMPROVED PULSE ENDURANCE AND POLYIMIDE COATING MATERIAL PREPARED THEREOF | PI ADVANCED MAT CO LTD (KR) | 2026-04-02 | — | — | US | claimed |
| US-20260078299-A1 | DISPERSION LIQUID, METHOD FOR MANUFACTURING QUANTUM DOT FILM, METHOD FOR MANUFACTURING PHOTODETECTOR, AND METHOD FOR MANUFACTURING IMAGE SENSOR | FUJIFILM CORPORATION (JP) | 2026-03-19 | — | — | US | claimed |
| EP-3971243-B1 | POLYAMIDEIMIDE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYAMIDEIMIDE RESIN | RESONAC CORP (JP) | 2026-02-25 | — | — | EP | claimed |
| US-20150253628-A1 | LIQUID CRYSTAL DISPLAY DEVICE, METHOD OF MANUFACTURING THE SAME, AND ALIGNMENT LAYER COMPOSITION | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-09-10 | — | — | US | claimed |
| US-9081291-B2 | Resist stripping solution composition, and method for stripping resist by using same | DONGWOO FINE-CHEM CO., LTD. (KR) | 2015-07-14 | — | — | US | claimed |
| US-9061505-B2 | Ink for inkjet, ink cartridge using the ink, inkjet recorder and ink recorded matter | RICOH COMPANY, LTD. (JP) | 2015-06-23 | — | — | US | claimed |
| US-9056993-B2 | Ink composition, inkjet recording method, and printed matter | RICOH COMPANY, LTD. (JP) | 2015-06-16 | — | — | US | claimed |
| US-8961674-B2 | Inkjet ink, ink cartridge containing the inkjet ink, inkjet recording apparatus using the ink cartridge, and print formed by the inkjet ink | RICOH COMPANY, LTD. (JP) | 2015-02-24 | — | — | US | claimed |
| US-20140356636-A1 | SOLUTION OF AROMATIC POLYAMIDE FOR PRODUCING DISPLAY ELEMENT, OPTICAL ELEMENT, OR ILLUMINATION ELEMENT | AKRON POLYMER SYSTEMS, INC. (US) | 2014-12-04 | — | — | US | claimed |
| US-20140272327-A1 | INK FOR INKJET, INK CARTRIDGE USING THE INK, INKJET RECORDER AND INK RECORDED MATTER | RICOH COMPANY, LTD. (JP) | 2014-09-18 | — | — | US | claimed |
| US-20140069295-A1 | INKJET INK, INK CARTRIDGE CONTAINING THE INKJET INK, INKJET RECORDING APPARATUS USING THE INK CARTRIDGE, AND PRINT FORMED BY THE INKJET INK | RICOH COMPANY, LTD. (JP) | 2014-03-13 | — | — | US | claimed |
| WO-2013034880-A2 | RADIATION CURABLE INKS | SERICOL LIMITED (GB) | 2013-03-14 | — | — | WO | claimed |
| US-20120181248-A1 | RESIST STRIPPING SOLUTION COMPOSITION, AND METHOD FOR STRIPPING RESIST BY USING SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2012-07-19 | — | — | US | claimed |