Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EP300 | Q09472 | 2/20 | 0.55 |
| ▸ | IDO1 | P14902 | 10/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.49 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.46 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.46 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.44 |
| ▸ | PIM1 | P11309 | 1/20 | 0.44 |
| ▸ | LTK | P29376 | 1/20 | 0.44 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.44 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10064143 | 0.91 | LMNA (0.57) | EP300IDO1LMNAPOLBRIPK1 | |
| SCHEMBL20306580 | 0.84 | IDO1 (0.59) | EP300IDO1KAT2BKAT8HSP90AA1 | |
| SCHEMBL10027976 | 0.81 | LMNA (0.59) | LMNAPOLBRIPK1 | |
| SCHEMBL16300542 | 0.80 | POLB (0.58) | LMNAPOLBRIPK1 | |
| SCHEMBL12863541 | 0.80 | POLB (0.58) | LMNAPOLBRIPK1 | |
| SCHEMBL17617963 | 0.78 | LMNA (0.60) | LMNAPOLBRIPK1 | |
| SCHEMBL16256513 | 0.78 | POLB (0.56) | LMNAPOLBRIPK1 | |
| SCHEMBL25631119 | 0.75 | CDC25B (0.50) | LMNAPOLBRIPK1 | |
| SCHEMBL590479 | 0.75 | RXFP1 (0.66) | EP300IDO1POLBKAT2BKAT8 | |
| SCHEMBL12863534 | 0.75 | POLB (0.56) | LMNAPOLBRIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170045818-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING BLOCKED ISOCYANATE STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20170045819-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING ACRYLAMIDE STRUCTURE AND ACRYLIC ACID ESTER STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-9285679-B2 | Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition | FUJIFILM CORPORATION (JP) | 2016-03-15 | — | — | US | disclosed |
| US-9029064-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20150010855-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2015-01-08 | — | — | US | disclosed |
| US-8492078-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8440386-B2 | Patterning process, resist composition, and acetal compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20120183903-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110177462-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | PARG, RAD51, CD38 | EP300 528/4885IDO1 4089/4885LMNA 102/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.