Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.59 |
| ▸ | GAA | P10253 | 6/20 | 0.50 |
| ▸ | HTT | P42858 | 4/20 | 0.50 |
| ▸ | RIPK1 | Q13546 | 4/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | KDM1A | O60341 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | CETP | P11597 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10064143 | 0.84 | LMNA (0.57) | LMNAPOLBGAAHTTRIPK1 | |
| SCHEMBL8243174 | 0.82 | CETP (0.62) | LMNAGAAHTTMAPTKMT2A | |
| SCHEMBL12963094 | 0.81 | LMNA (0.57) | LMNAPOLBGAAHTTRIPK1 | |
| SCHEMBL7207413 | 0.81 | LMNA (0.61) | LMNAPOLBGAAHTTRIPK1 | |
| SCHEMBL19422611 | 0.81 | POLB (0.57) | LMNAPOLBGAAHTTRIPK1 | |
| SCHEMBL10447368 | 0.81 | EP300 (0.55) | LMNAPOLBRIPK1 | |
| SCHEMBL14483803 | 0.81 | CA1 (0.59) | LMNAPOLB | |
| SCHEMBL5879414 | 0.81 | LMNA (0.65) | LMNAPOLBGAAHTTRIPK1 | |
| SCHEMBL1555152 | 0.80 | GAA (0.54) | LMNAGAAHTTMAPTKMT2A | |
| SCHEMBL28741300 | 0.80 | LMNA (0.56) | LMNAPOLBGAAHTTRIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-9519213-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20140255843-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-20120021357-A1 | POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME | NEC CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20110281217-A1 | NEGATIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND METHOD FOR PATTERNING USING THE SAME | NEC CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| US-7939241-B2 | (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | NEC CORPORATION (JP) | 2011-05-10 | — | — | US | disclosed |
| US-20090068587-A1 | (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | NEC CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20080241752-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20070041698-A1 | Photosensitive resin composition for forming optical waveguide, optical waveguide, and method for forming optical waveguide pattern | NEC CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090068587-A1 | (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | MMAB, DNMT3A, MAT1A | LMNA 4190/4885POLB 672/4885GAA 2810/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.