SCHEMBL104686

SCHEMBL104686

CCC[O-].CCC[O-].CCC[O-].[O-2].[V+5]

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.33
HDAC3 O15379 2/20 0.33
HDAC1 Q13547 2/20 0.33
HDAC2 Q92769 2/20 0.33
HDAC8 Q9BY41 2/20 0.33
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16731980 1.00 FFAR3 (0.33) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL32670930 1.00 FFAR3 (0.33) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL29906183 0.95 TSHR (0.33) LMNATSHR
SCHEMBL1976924 0.95 TSHR (0.33) LMNATSHR
SCHEMBL30855581 0.90
SCHEMBL15401247 0.90 LMNA (0.31) LMNATSHR
SCHEMBL6449559 0.84 TSHR (0.33) LMNATSHR
SCHEMBL3658482 0.84 TSHR (0.33) LMNATSHR
SCHEMBL105342 0.84
SCHEMBL3458910 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858151-B2 Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination NANOSOLAR, INC. (US) 2010-12-28 US claimed
US-7410631-B2 Metal phosphate sols, metal nanoparticles, metal-chalcogenide nanoparticles, and nanocomposites made therefrom APS LABORATORY (US) 2008-08-12 US claimed
US-7264874-B2 Preparation of metal chalcogenide nanoparticles and nanocomposites therefrom APS LABORATORY (US) 2007-09-04 US claimed
US-7153898-B2 Metal oxide sols as nanoscale additives for polymers APS LABORATORY (US) 2006-12-26 US claimed
WO-2006093799-A2 METAL PHOSPHATE SOLS, METAL NANOPARTICLES, METAL-CHALCOGENIDE NANOPARTICLES, AND NANOCOMPOSITES MADE THEREFROM APS LABORATORY (US) 2006-09-08 WO claimed
US-20060199886-A1 Metal phosphate sols, metal nanoparticles, metal-chalcogenide nanoparticles, and nanocomposites made therefrom APS LABORATORY 2006-09-07 US claimed
US-20060135669-A1 Preparation of metal chalcogenide nanoparticles and nanocomposites therefrom APS LABORATORY 2006-06-22 US claimed
US-6955771-B2 Metal oxide sols as nanoscale additives for polymers APS LABORATORY (US) 2005-10-18 US claimed
WO-2005081789-A2 Formation of CIGS Absorber Layer by Atomic Layer Deposition NANOSOLAR, INC. (US) 2005-09-09 WO claimed
US-20050186342-A1 Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination NANOSOLAR, INC. (US) 2005-08-25 US claimed
WO-2005035668-A2 PREPARATION OF METAL NANOPARTICLES AND NANOCOMPOSITES THEREFROM APS LABORATORY (US) 2005-04-21 WO claimed
US-6838486-B2 Preparation of metal nanoparticles and nanocomposites therefrom APS LABORATORY (US) 2005-01-04 US claimed
US-20040242740-A1 Metal oxide sols as nanoscale additives for polymers RYANG HONG-SON (US) 2004-12-02 US claimed
US-20040167257-A1 PREPARATION OF METAL NANOPARTICLES AND NANOCOMPOSITES THEREFROM APS LABORATORY 2004-08-26 US claimed
US-20040159824-A1 METAL OXIDE SOLS AS NANOSCALE ADDITIVES FOR POLYMERS APS LABORATORY 2004-08-19 US claimed
WO-2004063288-A1 METAL OXIDE SOLS AS NANOSCALE ADDITIVES FOR POLYMERS APS LABORATORY (US) 2004-07-29 WO claimed
US-4525468-A MAGNESIUM BIS(SILOXIDE) WITH TITANIUM TETRAALKOXIDE AND AN ALKOXIDE OF ANOTHER TRANSITION METAL, CHLORINATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1985-06-25 US claimed
WO-2024200898-A1 ELECTROCATALYTIC MIXED IRON-VANADIUM OXIDE ELECTRODE, PRODUCTION METHOD FOR SAME AND ITS USES IN HYDROGEN PRODUCTION UNIVERSITAT DE VALÈNCIA (ES) 2024-10-03 WO disclosed
US-4487883-A REVERSIBLE CROSSLINKING DUE TO MOISTURE OR H2O, HAIR SETTING AND CONDITIONING DOW CORNING CORPORATION (US) 1984-12-11 US disclosed
EP-0113992-A1 One-part moisture cured aminosiloxanes to set and condition hair DOW CORNING CORPORATION (US) 1984-07-25 EP disclosed