⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1271518 | 0.82 | — | — | |
| SCHEMBL272833 | 0.82 | — | — | |
| SCHEMBL6278336 | 0.79 | — | — | |
| SCHEMBL10476351 | 0.73 | THRB (0.38) | — | |
| SCHEMBL6359935 | 0.71 | — | — | |
| SCHEMBL7401569 | 0.70 | THRB (0.35) | — | |
| SCHEMBL408235 | 0.67 | — | — | |
| SCHEMBL321135 | 0.67 | — | — | |
| SCHEMBL30952869 | 0.67 | — | — | |
| SCHEMBL333470 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9891520-B2 | Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning | BASF SE (DE) | 2018-02-13 | — | — | US | disclosed |
| EP-3033408-A1 | THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING | BASF SE (DE) | 2016-06-22 | — | — | EP | disclosed |
| US-20160161846-A1 | THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING | BASF SE (DE) | 2016-06-09 | — | — | US | disclosed |
| US-9236256-B2 | Use of surfactants having at least three short-chain perfluorinated groups RF for manufacturing integrated circuits having patterns with line-space dimensions below 50 NM | BASF SE (DE) | 2016-01-12 | — | — | US | disclosed |
| WO-2015004596-A1 | THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING | BASF SE (DE) | 2015-01-15 | — | — | WO | disclosed |
| EP-2824511-A1 | The use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning | BASF SE (DE) | 2015-01-14 | — | — | EP | disclosed |
| EP-2668248-A1 | USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS FOR MANUFACTURING INTEGRATED CIRCUITS HAVING PATTERNS WITH LINE-SPACE DIMENSIONS BELOW 50NM | BASF SE (DE) | 2013-12-04 | — | — | EP | disclosed |
| US-20130288484-A1 | USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS RF FOR MANUFACTURING INTEGRATED CIRCUITS HAVING PATTERNS WITH LINE-SPACE DIMENSIONS BELOW 50 NM | BASF SE (DE) | 2013-10-31 | — | — | US | disclosed |
| WO-2012101545-A1 | USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS FOR MANUFACTURING INTEGRATED CIRCUITS HAVING PATTERNS WITH LINE-SPACE DIMENSIONS BELOW 50NM | BASF SE (DE) | 2012-08-02 | — | — | WO | disclosed |
| EP-2479616-A1 | The use of surfactants having at least three short-chain perfluorinated groups Rf for manufacturing integrated circuits having patterns with line-space dimensions below 50 nm | BASF SE (DE) | 2012-07-25 | — | — | EP | disclosed |