Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 5/20 | 0.52 |
| ▸ | RAB9A | P51151 | 5/20 | 0.52 |
| ▸ | RPA1 | P27694 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.39 |
| ▸ | AHR | P35869 | 1/20 | 0.39 |
| ▸ | NOTUM | Q6P988 | 2/20 | 0.38 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.38 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.38 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | CASP3 | P42574 | 2/20 | 0.37 |
| ▸ | DHFR | P00374 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL80044 | 0.83 | NPC1 (0.52) | NPC1RAB9ARPA1MEN1KMT2A | |
| SCHEMBL125517 | 0.81 | NPC1 (0.50) | NPC1RAB9ARPA1MEN1KMT2A | |
| SCHEMBL9849727 | 0.80 | NR1H4 (0.41) | NPC1RAB9AMEN1KMT2AAHR | |
| SCHEMBL9849715 | 0.78 | CYP1A2 (0.40) | NPC1RAB9AMEN1KMT2AADORA3 | |
| SCHEMBL9869365 | 0.78 | NPC1 (0.68) | NPC1RAB9ARPA1MEN1KMT2A | |
| SCHEMBL1043823 | 0.77 | ADORA2A (0.48) | NPC1RAB9AMEN1KMT2AADORA3 | |
| SCHEMBL1049369 | 0.76 | IDO1 (0.46) | NPC1RAB9ANOTUMMAPTSMN1; SMN2 | |
| SCHEMBL17269507 | 0.76 | NPC1 (0.65) | NPC1RAB9ARPA1MEN1KMT2A | |
| SCHEMBL14374410 | 0.76 | NPC1 (0.65) | NPC1RAB9ARPA1MEN1KMT2A | |
| SCHEMBL9622217 | 0.74 | ADORA3 (0.42) | NPC1RAB9AADORA3SMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| EP-0137228-B1 | PHOTOPOLYMERIZABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| US-11746255-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS LTD (GB) | 2023-09-05 | — | — | US | disclosed |
| CN-109562944-B | Hard mask composition | 亚历克斯·菲利普·格雷厄姆·罗宾逊 | 2022-09-09 | — | — | CN | disclosed |
| CN-112119133-B | Hard mask composition | 亚历克斯·P·G·罗宾逊 | 2022-05-24 | — | — | CN | disclosed |
| US-10438808-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS, LTD (GB) | 2019-10-08 | — | — | US | disclosed |
| US-10290500-B2 | Spin on hard mask material | IRRESISTIBLE MATERIALS LTD (GB) | 2019-05-14 | — | — | US | disclosed |
| US-20190127604-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2019-05-02 | — | — | US | disclosed |
| US-20170345669-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2017-11-30 | — | — | US | disclosed |
| US-5609988-A | NEGATIVE RESIST, NOVOLAK, METHYLOL OR METHOXYMETHYL CURING AGENT, 2-BENZODIOXOLYL-4,6-BIS(TRICHLOROMETHYL)TRIAZINE ACID GENERATING AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | disclosed |
| EP-0621509-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4661434-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-28 | — | — | US | disclosed |
| US-4657942-A | LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-14 | — | — | US | disclosed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | disclosed |