SCHEMBL80044

SCHEMBL80044

Clc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.52
RAB9A P51151 4/20 0.52
RPA1 P27694 1/20 0.39
ADORA3 P0DMS8 2/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
NOTUM Q6P988 2/20 0.38
NR1H2 P55055 2/20 0.38
NR1H3 Q13133 2/20 0.38
NR1H4 Q96RI1 1/20 0.38
MAPT P10636 1/20 0.38
CNR1 P21554 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
DHFR P00374 1/20 0.37
PKM P14618 1/20 0.37
DPP4 P27487 1/20 0.37
CASP3 P42574 1/20 0.36
SENP8 Q96LD8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL125517 0.98 NPC1 (0.50) NPC1RAB9ARPA1ADORA3MEN1
SCHEMBL8412982 0.91 NPC1 (0.38) NPC1RAB9AADORA3MEN1KMT2A
SCHEMBL8956230 0.89 KDM4E (0.47) NPC1RAB9AMEN1KMT2AMAPT
SCHEMBL11941643 0.87 NPC1 (0.44) NPC1RAB9AADORA3MEN1KMT2A
SCHEMBL5692393 0.86 SMN1; SMN2 (0.55) NPC1RAB9AMEN1KMT2AMAPT
SCHEMBL9368198 0.86 NPC1 (0.53) NPC1RAB9AKMT2ANOTUMMAPT
SCHEMBL15849066 0.84 NPC1 (0.42) NPC1RAB9ARPA1ADORA3MEN1
SCHEMBL1048071 0.83 NPC1 (0.52) NPC1RAB9ARPA1ADORA3MEN1
SCHEMBL306970 0.81 MEN1 (0.46) NPC1RAB9AADORA3MEN1KMT2A
SCHEMBL22129836 0.81 NPC1 (0.41) NPC1RAB9AADORA3MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1714 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
CN-115368494-B Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof 瑞红(苏州)电子化学品股份有限公司 2024-03-29 CN claimed
JP-4800972-B2 2011-10-26 JP claimed
US-7560221-B2 Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers KODAK GRAPHIC COMMUNICATIONS GMBH (DE) 2009-07-14 US claimed
EP-1558969-A4 INCORPORATION OF MARKINGS IN OPTICAL MEDIA SPECTRA SYSTEMS CORP (US) 2009-03-25 EP claimed
EP-1540416-A4 SYSTEM FOR APPLYING MARKINGS TO OPTICAL MEDIA SPECTRA SYSTEMS CORP (US) 2009-03-25 EP claimed
US-20070148583-A1 Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers KODAK POLYCHROME GRAPHICS, GMBH (DE) 2007-06-28 US claimed
EP-1706790-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH MERCAPTO-FUNCTIONALIZED FREE-RADICAL POLYMERIZABLE MONOMERS Kodak Polychrome Graphics GmbH (DE) 2006-10-04 EP claimed
EP-1539492-B1 HIGH SPEED NEGATIVE-WORKING THERMAL PRINTING PLATES KODAK POLYCHROME GRAPHICS LLC (US) 2006-05-17 EP claimed
WO-2003066338-A1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES KODAK POLYCHROME GRAPHICS LLC (US) 2003-08-14 WO claimed
US-20030124460-A1 High speed negative-working thermal printing plates KODAK PHILIPPINES LTD. 2003-07-03 US claimed
EP-0592790-B1 Negative photoresist composition SUMITOMO CHEMICAL CO (JP) 1998-03-11 EP claimed
EP-0621508-B1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-09-25 EP claimed
US-5496903-A PHOTPOLYMERIZABLE COATING NIPPON PAINT COMPANY, LTD. (JP) 1996-03-05 US claimed
US-5494777-A Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-02-27 US claimed
EP-0621508-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-10-26 EP claimed
EP-0592790-A1 Negative photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-04-20 EP claimed
US-5049481-A Merocyanine compound FUJI PHOTO FILM CO., LTD. (JP) 1991-09-17 US claimed
US-4239850-A PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE FUJI PHOTO FILM CO., LTD. (JP) 1980-12-16 US claimed