SCHEMBL10488392

SCHEMBL10488392

[N-]=[N+]=NS(=O)(=O)c1ccc(/N=N/c2ccc(N)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.58
CA9 Q16790 6/20 0.58
CA12 O43570 5/20 0.58
RAB9A P51151 4/20 0.48
MAPT P10636 3/20 0.48
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
NPC1 O15118 3/20 0.48
TDP1 Q9NUW8 2/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
F2 P00734 3/20 0.44
PRSS1 P07477 3/20 0.44
PRSS2 P07478 3/20 0.44
PRSS3 P35030 3/20 0.44
LMNA P02545 2/20 0.44
AGO2 Q9UKV8 2/20 0.44
CA1 P00915 2/20 0.43
CA5A P35218 2/20 0.43
CA5B Q9Y2D0 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10488398 1.00 CA2 (0.58) CA2CA9CA12RAB9AMAPT
SCHEMBL3090434 0.91 F2 (0.52) CA2CA9CA12MEN1KMT2A
Hydrochloric Acid SCHEMBL11101814 0.89 F2 (0.50) CA2CA9CA12MEN1KMT2A
SCHEMBL10823807 0.81 CA1 (0.43) CA2CA9MAPTF2PRSS1
SCHEMBL27074276 0.79 F2 (0.60) CA2CA9CA12RAB9AMAPT
SCHEMBL10488472 0.76 RAD51 (0.47) CA2CA9CA12RAB9AMAPT
SCHEMBL10488457 0.76 RAD51 (0.47) CA2CA9CA12RAB9AMAPT
SCHEMBL10488961 0.75 MAPT (0.52) CA2CA9CA12MAPTMEN1
SCHEMBL10488959 0.75 MAPT (0.52) CA2CA9CA12MAPTMEN1
SCHEMBL11323350 0.75 CA12 (0.73) CA2CA9CA12RAB9AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4835089-A Resist pattern forming process with dry etching HITACHI, LTD. (JP) 1989-05-30 US claimed