SCHEMBL10489554

SCHEMBL10489554

O=C(c1ccc(C(=O)C(Br)(Br)Br)cc1)C(Br)(Br)Br

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.44
TSHR P16473 1/20 0.44
CES1 P23141 7/20 0.43
CES2 O00748 6/20 0.43
CA2 P00918 3/20 0.41
CA1 P00915 2/20 0.39
LMNA P02545 2/20 0.38
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
SRD5A2 P31213 1/20 0.38
MAPT P10636 1/20 0.38
PKM P14618 1/20 0.38
HPGD P15428 1/20 0.38
HTT P42858 1/20 0.38
MLYCD O95822 3/20 0.37
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4656447 0.88 CES2 (0.62) CES1CES2CA2CA1LMNA
SCHEMBL10405986 0.86 CES2 (0.59) TSHRCES1CES2CA2CA1
SCHEMBL1799477 0.84 CES1 (0.64) TSHRCES1CES2CA2CA1
SCHEMBL23172558 0.82 CES2 (0.67) TSHRCES1CES2SRD5A2HPGD
SCHEMBL27390852 0.80 CES1 (0.36) CES1CA2
SCHEMBL9409745 0.79 ATM (0.33) TP53TSHRCES1CES2CA2
SCHEMBL4656668 0.78 CES1 (0.65) TSHRCES1CES2CA2CA1
Benzophenone SCHEMBL28069522 0.78 ALDH1A1 (0.70) TSHRCES1CES2LMNASRD5A2
Acetophenone SCHEMBL11353447 0.74 SMN1; SMN2 (0.56) TSHRCES1CES2LMNAMAPT
SCHEMBL10456503 0.74 CES1 (0.52) TSHRCES1CES2CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4829187-A COLORIMETRIC INDICATOR, EXPOSURE TO SUNLIGHT SHISEIDO COMPANY LTD. (JP) 1989-05-09 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4111692-A ALIPHATIC NITROGEN COMPOUND, HALOGEN COMPOUND AS FREE RADICAL GENERATOR TOYO BOSEKI KABUSHIKI KAISHA (JP) 1978-09-05 US disclosed