Propionaldehyde

Propionaldehyde

SCHEMBL105565

CCC=O.[Y]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119059548-B Yttrium oxyfluoride powder for plasma corrosion-resistant thermal spraying and preparation method thereof 山东拓普新材料科技有限公司 2025-01-24 CN claimed
CN-119059548-A Yttrium oxyfluoride powder for plasma corrosion-resistant thermal spraying and preparation method thereof 山东拓普新材料科技有限公司 2024-12-03 CN claimed
CN-114188535-A Composite cathode material, preparation method thereof and lithium ion battery 恒大新能源技术(深圳)有限公司 2022-03-15 CN claimed
US-6903035-B2 Inorganic composition, film, and method of producing film FUJI PHOTO FILM CO., LTD. (JP) 2005-06-07 US claimed
US-20030116061-A1 Inorganic composition, film, and method of producing film FUJI PHOTO FILM CO., LTD. 2003-06-26 US claimed
EP-1281689-A2 Inorganic composition, film made therefrom, and method for producing such film FUJI PHOTO FILM CO., LTD. (JP) 2003-02-05 EP claimed
JP-1069569-A None JP disclosed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
EP-0384727-B1 alpha-Olefin polymerisation catalysts comprising perovskite type complex compounds and composite material produced using the same SAKAI CHEMICAL INDUSTRY CO (JP) 1995-09-06 EP disclosed
US-5122510-A METHOD FOR PREPARING RARE EARTH-BARIUM-CUPRATE PRE-CERAMIC RESINS AND SUPERCONDUCTIVE MATERIALS PREPARED THEREFROM GENERAL ATOMICS (US) 1992-06-16 US disclosed
US-5100871-A Method for preparing rare earth-barium-cuprate pre-ceramic resins and superconductive materials prepared therefrom GENERAL ATOMICS (US) 1992-03-31 US disclosed
US-5057478-A Dielectric ceramic material SAKAI CHEMICAL INDUSTRY CO., LTD. (JP) 1991-10-15 US disclosed
EP-0431813-A1 Method for preparing rare earth -barium-cuprate pre-ceramic resins and super conductive materials prepared therefrom GENERAL ATOMICS (US) 1991-06-12 EP disclosed
EP-0384727-A2 alpha-Olefin polymerisation catalysts comprising perovskite type complex compounds and composite material produced using the same SAKAI CHEMICAL INDUSTRY CO., LTD., (JP) 1990-08-29 EP disclosed
JP-S6469569-A PRODUCTION OF SINTERED MATERIAL OF SILICON NITRIDE MITSUBISHI HEAVY IND LTD 1989-03-15 JP disclosed