SCHEMBL1055907

SCHEMBL1055907

CC(C(=O)O)C(c1ccccc1)(c1ccccc1)C(c1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.42
SRC P12931 1/20 0.42
CYP1A2 P05177 1/20 0.42
LMNA P02545 3/20 0.41
MAPK1 P28482 2/20 0.41
PTGS2 P35354 3/20 0.39
APAF1 O14727 1/20 0.39
MAPT P10636 3/20 0.38
PTGS1 P23219 2/20 0.38
CXCR1 P25024 2/20 0.38
CXCR2 P25025 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
RECQL P46063 1/20 0.38
KDM4E B2RXH2 1/20 0.38
ALDH1A1 P00352 1/20 0.38
CYP3A4 P08684 1/20 0.38
HPGD P15428 1/20 0.38
PMP22 Q01453 1/20 0.38
SLC22A6 Q4U2R8 1/20 0.38
HSD17B10 Q99714 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1055908 1.00 CYP2D6 (0.42) CYP2D6SRCCYP1A2LMNAMAPK1
SCHEMBL4870724 0.81 CYP2D6 (0.45) CYP2D6SRCCYP1A2LMNAMAPK1
SCHEMBL6570629 0.74 LMNA (0.38) CYP2D6SRCLMNAMAPK1KDM4E
SCHEMBL4579475 0.74 CYP1A2 (0.48) CYP2D6SRCCYP1A2PTGS2MAPT
SCHEMBL27583111 0.72 CYP2D6 (0.47) CYP2D6SRCCYP1A2PTGS2MAPT
SCHEMBL430340 0.72 CYP1A2 (0.47) CYP2D6CYP1A2PTGS2MAPTALDH1A1
SCHEMBL4365780 0.72 CYP1A2 (0.47) CYP2D6CYP1A2PTGS2MAPTALDH1A1
Bicarbonate SCHEMBL27539068 0.71 CYP2D6 (0.55) CYP2D6CYP1A2LMNAPTGS2MAPT
SCHEMBL17582896 0.71 CYP2D6 (0.46) CYP2D6CYP1A2LMNAPTGS2MAPT
SCHEMBL11426254 0.71 CYP2D6 (0.50) CYP2D6SRCCYP1A2PTGS2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2500088-A2 Molecular recognition material and production method thereof Shiseido Co., Ltd. (JP) 2012-09-19 EP disclosed
US-20110021347-A1 Molecule Recognizing Material And Process For Producing The Molecule Recognizing Material KEIO UNIVERSITY (JP) 2011-01-27 US disclosed
EP-2198952-A1 MOLECULE RECOGNIZING MATERIAL AND PROCESS FOR PRODUCING THE MOLECULE RECOGNIZING MATERIAL Keio University (JP) 2010-06-23 EP disclosed