SCHEMBL1058466

SCHEMBL1058466

CCC(OCC1CO1)[Si](O)(O)O

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
SMN1; SMN2 Q16637 1/20 0.37
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 2/20 0.34
MAPK1 P28482 1/20 0.34
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31
GLA P06280 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28307977 0.89 SMN1; SMN2 (0.41) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL15513608 0.85 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL1035031 0.84 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL3462781 0.81 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL28286186 0.81 SMN1; SMN2 (0.41) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL29152791 0.81 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL1059012 0.81 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL329862 0.81 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL29104566 0.81 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
Methyl Alcohol SCHEMBL28322456 0.80 ALDH1A1 (0.35) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110140306-A1 Composition for an Etching Mask Comprising a Silicon-Containing Material MOLECULAR IMPRINTS, INC. (US) 2011-06-16 US claimed
US-7906180-B2 hydroxy, propyl, methyl or phenyl-functional polysiloxane( silsesquioxane), hexamethoxymethylmelamine crosslinker, toulenesulfonic acid catalyst, and propylene glycol/1,2-, methyl ether 2-acetate as solvent; in-situ hardened mask to be created by polysiloxane MOLECULAR IMPRINTS, INC. (US) 2011-03-15 US claimed
EP-1614004-A4 POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD AND COMPOSITIONS THEREFOR MOLECULAR IMPRINTS INC (US) 2009-03-25 EP claimed
US-20080097065-A1 Composition for an etching mask comprising a silicon-containing material MOLECULAR IMPRINTS, INC. (US) 2008-04-24 US claimed
EP-1614004-A2 POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD AND COMPOSITIONS THEREFOR MOLECULAR IMPRINTS, INC. (US) 2006-01-11 EP claimed
US-20050192421-A1 Composition for an etching mask comprising a silicon-containing material MOLECULAR IMPRINTS, INC. (US) 2005-09-01 US claimed
WO-2004088414-A2 POSITIVE TONE BI-LAYER IMPRINT LITHOGRAPHY METHOD AND COMPOSITIONS THEREFOR MOLECULAR IMPRINTS, INC. (US) 2004-10-14 WO claimed
US-10826050-B1 Methods of preparing a safety battery NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC (US) 2020-11-03 US disclosed
US-9512034-B2 Hydrophilic film MITSUI CHEMICALS, INC. (JP) 2016-12-06 US disclosed
EP-2256153-B1 HYDROPHILIC FILM MITSUI CHEMICALS INC (JP) 2014-06-25 EP disclosed
US-20110008630-A1 HYDROPHILIC FILM MITSUI CHEMICALS, INC. (JP) 2011-01-13 US disclosed
EP-2256153-A1 HYDROPHILIC FILM Mitsui Chemicals, Inc. (JP) 2010-12-01 EP disclosed