SCHEMBL1059646

SCHEMBL1059646

CC(C)(C)[Si](C)(Cl)C(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.42
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27040093 0.78 ALDH1A1 (0.31) ALDH1A1
SCHEMBL2104556 0.76
SCHEMBL20873161 0.76 ALDH1A1 (0.46) ALDH1A1TSHR
SCHEMBL595 0.76
SCHEMBL9871519 0.73 ALDH1A1 (0.55) ALDH1A1TSHR
SCHEMBL1162396 0.73
Methane SCHEMBL28876184 0.73
Hydrochloric Acid SCHEMBL22319895 0.73
Potassium SCHEMBL31236839 0.73
SCHEMBL29800731 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US claimed
WO-2023115023-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
CN-114249786-A Preparation and application of nucleoside intermediate containing N, N-diacyl structure 上海彩迩文生化科技有限公司 2022-03-29 CN claimed
US-8445669-B2 Production process of ethynylthymidine compounds from 5-methyluridine as a starting material HAMARI CHEMICALS, LTD. (JP) 2013-05-21 US claimed
CN-101357930-B Adefovir dipivoxil preparation method ZHUHAI UNITED LAB CO LTD 2011-06-29 CN claimed
CN-101357930-A Adefovir dipivoxil preparation method ZHUHAI UNITED LAB CO LTD (CN) 2009-02-04 CN claimed
CN-1923792-A (S) 6-arylmethyl-5-hydroxyl-3-oxy-hecanoic acid t-butyl ester and preparation method thereof UNIV ZHEJIANG (CN) 2007-03-07 CN claimed
WO-2001060932-A1 ANTIFOULING PAINT COMPOSITION J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) 2001-08-23 WO claimed
EP-4653419-A1 LINKER FOR ANTIBODY-DRUG CONJUGATES, AND ANTIBODY-DRUG CONJUGATE Otsuka Pharmaceutical Co., Ltd. (JP) 2025-11-26 EP disclosed
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US disclosed
WO-2024154763-A1 LINKER FOR ANTIBODY-DRUG CONJUGATES, AND ANTIBODY-DRUG CONJUGATE 大塚製薬株式会社 2024-07-25 WO disclosed
CN-117003788-A Substituted nicotinamide organosilicon compound and preparation method and application thereof 南开大学 2023-11-07 CN disclosed
WO-2023115023-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RESEARCH CORPORATION (US) 2023-06-22 WO disclosed
CN-114249786-A Preparation and application of nucleoside intermediate containing N, N-diacyl structure 上海彩迩文生化科技有限公司 2022-03-29 CN disclosed
WO-2001060932-A1 ANTIFOULING PAINT COMPOSITION J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) 2001-08-23 WO disclosed
EP-1095947-A1 NOVEL ANTIBACTERIAL COMPOUNDS Sankyo Company Limited (JP) 2001-05-02 EP disclosed
EP-1050536-A2 2-(Benz-)Imidazol-, 2-(Benz-)Oxazol- or 2-(Benz-)Thiazol-substituted Silanes Wacker-Chemie GmbH (DE) 2000-11-08 EP disclosed
EP-0423948-B1 Removal of hydrogen-containing silanes from organosilane mixtures DOW CORNING (US) 1999-01-20 EP disclosed
EP-0423948-A2 Removal of hydrogen-containing silanes from organosilane mixtures DOW CORNING CORPORATION (US) 1991-04-24 EP disclosed
US-4985579-A Reacting with a Hydrogen Halide, Separation by Distillation DOW CORNING CORPORATION (US) 1991-01-15 US disclosed