⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL595 | 0.80 | — | — | |
| SCHEMBL20873161 | 0.80 | ALDH1A1 (0.46) | — | |
| SCHEMBL29800731 | 0.76 | — | — | |
| SCHEMBL1059646 | 0.76 | ALDH1A1 (0.42) | — | |
| Methane SCHEMBL28876184 | 0.76 | — | — | |
| SCHEMBL1162396 | 0.76 | — | — | |
| SCHEMBL4073598 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL22319895 | 0.76 | — | — | |
| SCHEMBL9871519 | 0.76 | ALDH1A1 (0.55) | — | |
| Potassium SCHEMBL31236839 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | claimed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-4481366-A | Process for the preparation of a trifluorovinylsilane, and fluorine-containing polymer and process for its preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1984-11-06 | — | — | US | claimed |
| EP-0119404-A1 | Fluorine-containing polymer and process for its preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1984-09-26 | — | — | EP | claimed |
| JP-3072487-A | — | — | None | — | — | JP | disclosed |
| JP-60246390-A | — | — | None | — | — | JP | disclosed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| CN-115605530-B | Polycarbosilazanes and compositions comprising the same and methods of making silicon-containing films using the same | 默克专利有限公司 | 2024-09-27 | — | — | CN | disclosed |
| WO-2024149694-A1 | NITROGENOUS HETEROCYCLES FOR ORGANIC ELECTROLUMINESCENT DEVICES | MERCK PATENT GMBH (DE) | 2024-07-18 | — | — | WO | disclosed |
| US-11999827-B2 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | MERCK PATENT GMBH (DE) | 2024-06-04 | — | — | US | disclosed |
| EP-4146725-B1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2024-05-22 | — | — | EP | disclosed |
| EP-0405560-A2 | Preparation of tertiary-hydrocarbylsilyl compounds | Dow Corning Toray Silicone Company, Limited (JP) | 1991-01-02 | — | — | EP | disclosed |
| US-4822716-A | FINE PATTERN SEMICONDUCTOR, INTEGRATED CIRCUIT | KABUSHIKI KAISHA TOSHIBA (JP) | 1989-04-18 | — | — | US | disclosed |
| EP-0119404-B1 | FLUORINE-CONTAINING POLYMER AND PROCESS FOR ITS PREPARATION | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1988-04-06 | — | — | EP | disclosed |
| EP-0231497-A1 | Silicone resist materials containing polysiloxanes | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-08-12 | — | — | EP | disclosed |
| JP-S60246390-A | T-BUTYLPHENYLMETHYLCHLOROSILANE | SHIN ETSU CHEM CO LTD | 1985-12-06 | — | — | JP | disclosed |
| US-4481366-A | Process for the preparation of a trifluorovinylsilane, and fluorine-containing polymer and process for its preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1984-11-06 | — | — | US | disclosed |
| EP-0119404-A1 | Fluorine-containing polymer and process for its preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1984-09-26 | — | — | EP | disclosed |
| US-4307212-A | Curable epoxy resins | GENERAL ELECTRIC COMPANY (US) | 1981-12-22 | — | — | US | disclosed |