SCHEMBL10604376

SCHEMBL10604376

CC(O)C(O)(N=C=O)N=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4929005 0.71 MAPK1 (0.33)
SCHEMBL28817469 0.67 LMNA (0.31)
SCHEMBL11541764 0.67
SCHEMBL27614435 0.64
SCHEMBL10226559 0.61 TSHR (0.30)
SCHEMBL9680205 0.61
SCHEMBL13739001 0.61 TSHR (0.30)
SCHEMBL28284418 0.61
SCHEMBL27856067 0.61
SCHEMBL7151223 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128306-A1 COMPOSITE POLYMER MATERIAL, METHOD FOR PRODUCING SAME, AND OPTICAL MATERIAL 国立大学法人大阪大学 2024-06-20 WO disclosed
EP-4375312-A1 SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL OSAKA UNIVERSITY (JP) 2024-05-29 EP disclosed
CN-117693545-A Organosilicon polymer compound and organosilicon polymer material 国立大学法人大阪大学 2024-03-12 CN disclosed
US-20230192931-A1 HOST-GROUP-CONTAINING POLYMERIZABLE MONOMER, POLYMER MATERIAL, METHOD FOR PRODUCING SAME, AND CLATHRATE COMPOUND AND METHOD FOR PRODUCING SAME OSAKA UNIVERSITY (JP) 2023-06-22 US disclosed
CN-111801355-B Polymer material and method for producing same 国立大学法人大阪大学 2023-02-28 CN disclosed
WO-2023003043-A1 SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL 国立大学法人大阪大学 2023-01-26 WO disclosed
CN-110922518-B Water-resistant intumescent flame retardant and preparation method and application thereof 华东理工大学 2021-04-23 CN disclosed
US-20210040238-A1 POLYMER MATERIAL AND METHOD FOR MANUFACTURING SAME OSAKA UNIVERSITY (JP) 2021-02-11 US disclosed
EP-3760646-A1 POLYMER MATERIAL AND METHOD FOR MANUFACTURING SAME Osaka University (JP) 2021-01-06 EP disclosed
CN-111801355-A Polymer material and method for producing same 国立大学法人大阪大学 2020-10-20 CN disclosed
CN-110922518-A Water-resistant intumescent flame retardant and preparation method and application thereof 华东理工大学 2020-03-27 CN disclosed
CN-108348885-A The microcapsules and composition of the controlled release of active matter are provided 诺赛尔股份有限公司 2018-07-31 CN disclosed
CN-107338661-A Thermal sublimation printing ink for transfer printing 纳米及先进材料研发院有限公司 2017-11-10 CN disclosed
EP-0143552-B1 COMPOSITE MEMBRANE AND PROCESS FOR THE PRODUCTION THEREOF NITTO DENKO CORPORATION (JP) 1989-09-06 EP disclosed
US-4618534-A ANISOTROPIC POLYIMIDE RESIN COATED WITH THIN LAYER OF CROSSLINKED POLYSILOXANE NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) 1986-10-21 US disclosed
EP-0143552-A2 Composite membrane and process for the production thereof NITTO DENKO CORPORATION (JP) 1985-06-05 EP disclosed