Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.65 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.54 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 1/20 | 0.52 |
| ▸ | CES2 | O00748 | 2/20 | 0.50 |
| ▸ | CES1 | P23141 | 2/20 | 0.50 |
| ▸ | DAO | P14920 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.50 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.50 |
| ▸ | BCL2 | P10415 | 1/20 | 0.48 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.48 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.48 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27789267 | 0.95 | ALDH1A1 (0.59) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL28678655 | 0.92 | ALDH1A1 (0.68) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL2710099 | 0.86 | ALDH1A1 (0.54) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL27415815 | 0.84 | ALDH1A1 (0.52) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL29727844 | 0.84 | ALDH1A1 (0.52) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL29213656 | 0.84 | ALDH1A1 (0.52) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL7896024 | 0.84 | ALDH1A1 (0.52) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL10767680 | 0.84 | LIG1 (0.56) | ALDH1A1MEN1KMT2AMAPTLMNA | |
| SCHEMBL30550350 | 0.83 | ALDH1A1 (0.56) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 | |
| SCHEMBL1445642 | 0.81 | BCL2 (0.56) | ALDH1A1ATMTDP1L3MBTL1SRD5A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 856 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118085587-B | Ultraviolet absorber, modified polyester, and preparation methods and applications thereof | 中国科学院宁波材料技术与工程研究所 | 2024-06-25 | — | — | CN | claimed |
| CN-118085587-A | Ultraviolet absorber, modified polyester, and preparation methods and applications thereof | 中国科学院宁波材料技术与工程研究所 | 2024-05-28 | — | — | CN | claimed |
| CN-117964468-A | Preparation method of 2,2',3, 4' -pentahydroxy benzophenone | 上海予君生物科技发展有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-115403959-A | Preparation method of colorful resin coating stock solution with polarity difference | 扬州市祥华新材料科技有限公司 | 2022-11-29 | — | — | CN | claimed |
| CN-112731765-A | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2021-04-30 | — | — | CN | claimed |
| CN-105658702-B | High-fire resistance polysilsesquioxane class photosensitive polymer combination | LTC有限公司 | 2018-08-07 | — | — | CN | claimed |
| CN-106138018-A | Dihydroxy benaophenonel application in preparing antiviral and antitumor drug | 广州洁成生物科技有限公司 | 2016-11-23 | — | — | CN | claimed |
| CN-1916111-B | Organic composition, liquid crystal display including the same and method of manufacturing liquid crystal display | SAMSUNG DISPLAY CO LTD | 2014-01-15 | — | — | CN | claimed |
| US-8563214-B2 | Radiation sensitive resin composition and method of forming an interlayer insulating film | SHARP CORPORATION (JP) | 2013-10-22 | — | — | US | claimed |
| CN-101081807-B | Method for improving cleanliness of electron chemicals | TIANJIN MEIYIN MEDICINE TECHNOLOGY CO LTD | 2012-12-19 | — | — | CN | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| CN-101081807-A | Method for improving cleanliness of electron chemicals | TIANJIN REFINE CHEMICALS SCIEN (CN) | 2007-12-05 | — | — | CN | claimed |
| CN-1768303-A | Photoresist composition | AZ ELECTRONIC MATERIALS USA (US) | 2006-05-03 | — | — | CN | claimed |
| CN-1768302-A | Photoresist composition | AZ ELECTRONIC MATERIALS USA (US) | 2006-05-03 | — | — | CN | claimed |
| EP-0239423-B1 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-03-20 | — | — | EP | claimed |
| EP-0287212-B1 | Positive photosensitive planographic printing plate | MITSUBISHI CHEM IND (JP) | 1994-12-28 | — | — | EP | claimed |
| US-5182183-A | Chemical resistance; printing durability | MITSUBISHI KASEI CORPORATION (JP) | 1993-01-26 | — | — | US | claimed |
| US-5162510-A | Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide | HOECHST CELANESE CORPORATION (US) | 1992-11-10 | — | — | US | claimed |
| US-5019479-A | Photoresists for integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-28 | — | — | US | claimed |
| EP-0287212-A1 | Positive photosensitive planographic printing plate | Mitsubishi Chemical Corporation (JP) | 1988-10-19 | — | — | EP | claimed |