⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetone SCHEMBL7644831 | 0.74 | — | — | |
| SCHEMBL23149810 | 0.72 | — | — | |
| SCHEMBL1144872 | 0.67 | — | — | |
| SCHEMBL114562 | 0.67 | — | — | |
| SCHEMBL10634202 | 0.67 | — | — | |
| SCHEMBL11121864 | 0.67 | ALDH1A1 (0.50) | — | |
| SCHEMBL221318 | 0.67 | — | — | |
| Ethaneperoxoic Acid SCHEMBL11873237 | 0.67 | — | — | |
| Ethaneperoxoic Acid SCHEMBL6329984 | 0.67 | — | — | |
| SCHEMBL27256292 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0099051-B1 | CATHODE HAVING HIGH DURABILITY AND LOW HYDROGEN OVERVOLTAGE AND PROCESS FOR THE PRODUCTION THEREOF | ASAHI GLASS COMPANY LTD. (JP) | 1988-10-12 | — | — | EP | disclosed |
| EP-0209913-A2 | Cathode having high durability and low hydrogen overvoltage | ASAHI GLASS COMPANY LTD. (JP) | 1987-01-28 | — | — | EP | disclosed |
| US-4536259-A | ALLOY BEING COMPOSITE COATED ONTO ELECTRODE | ASAHI GLASS COMPANY LTD. (JP) | 1985-08-20 | — | — | US | disclosed |
| US-4498962-A | ELECTRODE SUBSTRATE WITH ELECTROCHEMICAL ALLOY COATING CONTAING NICKEL, AND OR COBALT; ALUMINUM, ZINC, MAGESIUM AND/OR SILLCON;AND RENIUM AND /OR NOBLE METAL | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1985-02-12 | — | — | US | disclosed |
| EP-0099051-A2 | Cathode having high durability and low hydrogen overvoltage and process for the production thereof | ASAHI GLASS COMPANY LTD. (JP) | 1984-01-25 | — | — | EP | disclosed |
| US-4302322-A | PLATED LAYER OF NICKEL OR COBALT CONTAINING PARTIALLY EXPOSED PARTICLES OF NICKEL OR COBALT; CORROSION RESISTANCE | ASAHI GLASS COMPANY, LTD. (JP) | 1981-11-24 | — | — | US | disclosed |