SCHEMBL106759

SCHEMBL106759

CCOC(C)OC(=O)CC

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.50
MEN1 O00255 1/20 0.36
CYP2C19 P33261 1/20 0.36
RECQL P46063 1/20 0.36
KMT2A Q03164 1/20 0.36
ALDH1A1 P00352 3/20 0.33
THRB P10828 1/20 0.33
MGAM O43451 1/20 0.33
GAA P10253 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
SOAT1 P35610 1/20 0.33
NAAA Q02083 1/20 0.31
TRPA1 O75762 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL18419388 0.94 LMNA (0.44) LMNAMEN1CYP2C19RECQLKMT2A
SCHEMBL8709482 0.89 LMNA (0.44) LMNAMEN1CYP2C19RECQLKMT2A
SCHEMBL2306711 0.86 LMNA (0.50) LMNAALDH1A1THRBMGAMGAA
SCHEMBL11965993 0.86 MEN1 (0.36) LMNAMEN1CYP2C19RECQLKMT2A
SCHEMBL9598364 0.86 LMNA (0.50) LMNAALDH1A1THRBMGAMGAA
SCHEMBL6300032 0.85 CYP2C19 (0.41) LMNAMEN1CYP2C19RECQLKMT2A
SCHEMBL18256749 0.84 MEN1 (0.35) LMNAMEN1CYP2C19RECQLKMT2A
SCHEMBL5512302 0.84 LMNA (0.48) LMNAALDH1A1THRBMGAMGAA
SCHEMBL5512305 0.84 LMNA (0.48) LMNAALDH1A1THRBMGAMGAA
SCHEMBL7187644 0.82 LMNA (0.46) LMNAMEN1KMT2AALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1957 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116487723-A Production process of explosion-proof piece of lithium battery cover plate 上海富锲智能科技有限公司 2023-07-25 CN claimed
US-20210333709-A1 ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION YOUNG CHANG CHEMICAL CO., LTD (KR) 2021-10-28 US claimed
EP-3835870-A1 ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION Young Chang Chemical Co., Ltd. (KR) 2021-06-16 EP claimed
US-10472535-B2 Method for producing fluorinated copolymer solution, and coating composition AGC Inc. (JP) 2019-11-12 US claimed
CN-110032042-A Negative photoresist composition and its application method for laser ablation AZ电子材料卢森堡有限公司 2019-07-19 CN claimed
US-9796803-B2 Under layer film-forming composition for imprints and method of forming pattern FUJIFILM CORPORATION (JP) 2017-10-24 US claimed
US-9688063-B2 Method for forming an article having a decorative surface 3M INNOVATIVE PROPERTIES COMPANY (US) 2017-06-27 US claimed
EP-1504050-B1 HYDROCARBON-TERMINATED POLYETHER-POLYAMIDE BLOCK COPOLYMERS AND USES THEREOF CRODA INT PLC (GB) 2016-11-16 EP claimed
CN-103665726-B Compositions and for preparing the method for pattern on base material 罗门哈斯电子材料有限公司 2016-08-17 CN claimed
US-20160193826-A1 METHOD FOR FORMING AN ARTICLE HAVING A DECORATIVE SURFACE 3M INNOVATIVE PROPERTIES COMPANY 2016-07-07 US claimed
EP-0763065-B1 USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS GRACE W R & CO (US) 1999-08-18 EP claimed
EP-0921561-A2 Composition for film formation and film JSR Corporation (JP) 1999-06-09 EP claimed
EP-0766717-B1 AT LEAST THREE-PART COATING AGENT, PROCESS FOR PRODUCING IT AND ITS USE BASF COATINGS AG (DE) 1999-03-17 EP claimed
CN-1200130-A Coating composition containing at least three components, preparation method and application thereof BASF LACKE & FARBEN (DE) 1998-11-25 CN claimed
US-5817733-A BINDERS IN COATING COMPOSITION BASF LACKE & FARBEN, AG (DE) 1998-10-06 US claimed
EP-0740674-B1 POLYURETHANE RESINS, PROCESS FOR PRODUCING THEM AND THEIR USE IN WATER-DILUTABLE COATING AGENTS BASF COATINGS AG (DE) 1998-06-17 EP claimed
CN-1137346-A Synergistic weedicide composite SICHUAN PROV NATURAL RESOURCES (CN) 1996-12-11 CN claimed
EP-0568476-B1 Silicon-containing positive resist and method of using the same in thin film packaging technology IBM (US) 1995-10-11 EP claimed
US-5422223-A Polysilsesquioxanes having diazonaphthoquinone sulfonyloxy group modifiers; barrier films for lithographic process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-06-06 US claimed
EP-0568476-A2 Silicon-containing positive resist and method of using the same in thin film packaging technology International Business Machines Corporation (US) 1993-11-03 EP claimed