⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15369951 | 1.00 | — | — | |
| SCHEMBL14316098 | 1.00 | — | — | |
| SCHEMBL22143636 | 0.97 | — | — | |
| SCHEMBL5618654 | 0.97 | — | — | |
| SCHEMBL15692338 | 0.85 | — | — | |
| SCHEMBL13522863 | 0.84 | — | — | |
| SCHEMBL27999995 | 0.84 | — | — | |
| SCHEMBL24618702 | 0.83 | ADH1C (0.31) | — | |
| SCHEMBL20574346 | 0.81 | ADH1A (0.34) | — | |
| SCHEMBL14209235 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912699-B2 | Tau-protein targeting compounds and associated | ARVINAS OPERATIONS, INC. (US) | 2024-02-27 | — | — | US | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| CN-113227281-B | Film-forming composition | 日产化学株式会社 | 2023-03-10 | — | — | CN | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| WO-2023287736-A1 | NOVEL BIS-AMIDE CONTAINING COMPOUNDS EXHIBITING ANTIFUNGAL ACTIVITY AND THEIR METHOD OF USE | FOX CHASE CHEMICAL DIVERSITY CENTER, INC. (US) | 2023-01-19 | — | — | WO | disclosed |
| CN-113227281-A | Film-forming composition | 日产化学株式会社 | 2021-08-06 | — | — | CN | disclosed |
| US-10845703-B2 | Film-forming composition containing silicone having crosslinking reactivity | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-24 | — | — | US | disclosed |
| CN-107075302-B | Film-forming composition containing crosslinking reactive silicon | 日产化学工业株式会社 | 2020-08-04 | — | — | CN | disclosed |
| CN-101636392-A | Process for production of optically active epoxy compound | NISSAN CHEMICAL IND LTD | 2010-01-27 | — | — | CN | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090264445-A1 | PYRROLIDINONE GLUCOKINASE ACTIVATORS | BERTHEL STEVEN JOSEPH | 2009-10-22 | — | — | US | disclosed |
| WO-2009127546-A1 | PYRROLIDINONE GLUCOKINASE ACTIVATORS | F. HOFFMANN-LA ROCHE AG (CH) | 2009-10-22 | — | — | WO | disclosed |
| CN-101558358-A | Resist underlayer film forming composition containing low molecular weight dissolution promoter | NISSAN CHEMICAL IND LTD (JP) | 2009-10-14 | — | — | CN | disclosed |
| CN-101506736-A | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL IND LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| CN-101227885-A | Wrinkle preventing/improving agent | SHISEIDO CO LTD (JP) | 2008-07-23 | — | — | CN | disclosed |
| EP-1908454-A1 | WRINKLE-PREVENTIVE/AMELIORATING AGENT | SHISEIDO COMPANY, LTD. (JP) | 2008-04-09 | — | — | EP | disclosed |
| US-6153648-A | Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-1016649-A1 | IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |