SCHEMBL1068976

SCHEMBL1068976

C=C(C(=O)O)C1OCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4302730 0.72
SCHEMBL11496071 0.71
SCHEMBL1845838 0.71
SCHEMBL1050160 0.70
SCHEMBL9615848 0.70
SCHEMBL5530934 0.69
SCHEMBL15189343 0.67
SCHEMBL156420 0.67 NOS2 (0.43)
SCHEMBL3128757 0.66 ARG1 (0.33)
SCHEMBL414440 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2298958-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film Konica Minolta Holdings, Inc. (JP) 2011-03-23 EP disclosed
EP-2278047-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film Konica Minolta Holdings, Inc. (JP) 2011-01-26 EP disclosed
US-20090267489-A1 GAS BARRIER THIN FILM LAMINATE, GAS BARRIER RESIN SUBSTRATE AND ORGANIC EL DEVICE KONICA MINOLTA HOLDINGS, INC. (JP) 2009-10-29 US disclosed
US-20090252893-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film KONICA MINOLTA, HOLDINGS, INC. (JP) 2009-10-08 US disclosed
EP-1921180-A1 PLASMA DISCHARGE PROCESSING DEVICE AND PRODUCTION METHOD OF GAS BARRIER FILM KONICA MINOLTA HOLDINGS, INC. (JP) 2008-05-14 EP disclosed