SCHEMBL10710751

SCHEMBL10710751

O=P(O)(O)C(NCCNC(P(=O)(O)O)P(=O)(O)O)P(=O)(O)O.[CH2]CNC(P(=O)(O)O)P(=O)(O)O

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LAP3 P28838 1/20 0.32
CA12 O43570 3/20 0.31
MMP2 P08253 3/20 0.31
CA9 Q16790 2/20 0.31
CA14 Q9ULX7 1/20 0.31
PGK1 P00558 1/20 0.31
PGK2 P07205 1/20 0.31
KDM4E B2RXH2 1/20 0.30
THRB P10828 1/20 0.30
MAPK1 P28482 1/20 0.30
HSD17B10 Q99714 1/20 0.30
ANPEP P15144 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL731378 0.87 MMP2 (0.39) LAP3CA12MMP2CA9KDM4E
SCHEMBL285956 0.74 CA12 (0.33) CA12MMP2CA9KDM4ETHRB
SCHEMBL17187190 0.74 S1PR2 (0.40) CA12MMP2CA9KDM4ETHRB
SCHEMBL9711407 0.72 TYMS (0.35) CA12MMP2CA9CA14KDM4E
(Propylamino)Methylenediphosphonic Acid SCHEMBL8817761 0.72 MMP2 (0.50) LAP3MMP2ANPEP
SCHEMBL8761864 0.70 FDPS (0.48) CA12MMP2CA9KDM4ETHRB
SCHEMBL10613308 0.70 ANPEP (0.34) CA12MMP2CA9KDM4ETHRB
SCHEMBL18230241 0.70 ANPEP (0.53) CA12CA9CA14KDM4EANPEP
SCHEMBL4368473 0.68 BLM (0.48) CA12CA9CA14HSD17B10ANPEP
(Butylamino)Methylenediphosphonic Acid SCHEMBL7786904 0.68 MMP2 (0.48) LAP3MMP2ANPEP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0148158-B1 PROCESS FOR ELUTING INDIUM FROM A CHELATE RESIN CONTAINING ADSORBED INDIUM SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-04-20 EP disclosed
US-4565673-A USING A HALOGEN-FREE ACID FOLLOWED BY A HALOGEN-CONTAINING SOLUTION FOR SELECTIVE SEPARATION FROM OTHER METALS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-01-21 US disclosed
EP-0148158-A2 Process for eluting indium from a chelate resin containing adsorbed indium SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1985-07-10 EP disclosed