Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.71 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.59 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.33 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL28100333 | 0.93 | TDP1 (0.62) | TDP1HSD17B10USP2HTTLPAR5 | |
| Propylene Glycol SCHEMBL3796745 | 0.90 | TDP1 (0.58) | TDP1HSD17B10USP2HTT | |
| SCHEMBL13471910 | 0.88 | TDP1 (0.64) | TDP1HSD17B10USP2HTTSPHK1 | |
| SCHEMBL135405 | 0.87 | TDP1 (0.68) | TDP1HSD17B10USP2HTTSPHK1 | |
| SCHEMBL15290418 | 0.86 | TDP1 (0.74) | TDP1HSD17B10USP2HTTSPHK1 | |
| Ammonia Solution, Strong SCHEMBL29094792 | 0.85 | TDP1 (0.65) | TDP1HSD17B10USP2HTT | |
| SCHEMBL13471911 | 0.84 | TDP1 (0.60) | TDP1HSD17B10USP2HTT | |
| Propylene Glycol SCHEMBL29215792 | 0.84 | TDP1 (0.55) | TDP1HSD17B10USP2 | |
| SCHEMBL5320748 | 0.83 | TDP1 (0.70) | TDP1HSD17B10USP2HTTSPHK1 | |
| SCHEMBL2076806 | 0.83 | TDP1 (0.59) | TDP1HSD17B10USP2HTTSPHK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105867069-B | Negative light-sensitive resin combination, the photocuring pattern and image display device formed using it | 东友精细化工有限公司 | 2019-10-08 | — | — | CN | disclosed |
| CN-105867069-A | Negative-type photosensitive resin composition, photocuring pattern formed by using the same and image display device | 东友精细化工有限公司 | 2016-08-17 | — | — | CN | disclosed |
| EP-0225099-A2 | Process for continuously producing a propylene-ethylene block copolymer | Chisso Corporation (JP) | 1987-06-10 | — | — | EP | disclosed |