SCHEMBL10780944

SCHEMBL10780944

NC(=O)Oc1ccccc1C(=O)NO

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIG1 P18858 1/20 0.53
KDM4E B2RXH2 3/20 0.50
GAA P10253 2/20 0.50
MPO P05164 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
HIF1A Q16665 1/20 0.50
CTSD P07339 1/20 0.47
HDAC8 Q9BY41 2/20 0.46
MMP3 P08254 1/20 0.46
KMT2A Q03164 3/20 0.45
MAPT P10636 2/20 0.45
USP2 O75604 1/20 0.45
LMNA P02545 1/20 0.44
HPGD P15428 3/20 0.43
HSD17B10 Q99714 3/20 0.43
ALDH1A1 P00352 1/20 0.42
ESR1 P03372 1/20 0.42
ITGB3 P05106 1/20 0.42
ITGA2B P08514 1/20 0.42
HMGB1 P09429 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17479848 0.85 CTSD (0.66) KDM4EGAACTSDKMT2AMAPT
SCHEMBL28010210 0.81 KDM4E (0.65) LIG1KDM4EGAAMPOSMN1; SMN2
SCHEMBL5302217 0.81 KDM4E (0.65) LIG1KDM4EGAAMPOSMN1; SMN2
SCHEMBL11794672 0.81 KMT2A (0.64) KDM4EGAAKMT2AMAPTUSP2
SCHEMBL11852729 0.80 CTNNB1 (0.60) KDM4EGAAKMT2AMAPTLMNA
SCHEMBL30225393 0.80 HCRTR1 (0.54) KDM4EHIF1ACTSDKMT2AMAPT
SCHEMBL28681569 0.80 NPSR1 (0.47) KDM4ESMN1; SMN2CTSDKMT2AMAPT
SCHEMBL10781020 0.79 MAOB (0.56) LIG1KDM4EGAAMPOSMN1; SMN2
SCHEMBL1810676 0.79 KDM4E (0.66) KDM4ESMN1; SMN2KMT2AMAPTUSP2
2-(Aminocarbonyl)Oxybenzoic Acid Methyl Ester SCHEMBL10781699 0.78 SLC6A3 (0.67) KDM4EGAACTSDKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0120402-B1 BASE PRECURSOR FUJI PHOTO FILM CO., LTD. (JP) 1987-11-11 EP disclosed
EP-0120661-B1 HEAT DEVELOPABLE COLOR LIGHT-SENSITIVE MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 1987-05-27 EP disclosed
US-4637902-A BASE PRECURSORS FUJI PHOTO FILM CO., LTD. (JP) 1987-01-20 US disclosed
US-4511650-A Heat developable color light-sensitive materials with base releasors FUJI PHOTO FILM CO., LTD. (JP) 1985-04-16 US disclosed
EP-0120402-A1 Base precursor FUJI PHOTO FILM CO., LTD. (JP) 1984-10-03 EP disclosed
EP-0120661-A2 Heat developable color light-sensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1984-10-03 EP disclosed