SCHEMBL1080160

SCHEMBL1080160

CCCC(=O)CC(=O)[O-].CCO[Al+]OCC

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 4/20 0.43
HDAC1 Q13547 4/20 0.43
HDAC2 Q92769 4/20 0.43
HDAC8 Q9BY41 4/20 0.43
FFAR3 O14843 3/20 0.43
CES2 O00748 1/20 0.36
CES1 P23141 1/20 0.36
CA1 P00915 1/20 0.34
CA4 P22748 2/20 0.33
HAO1 Q9UJM8 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HDAC6 Q9UBN7 1/20 0.31
CTSD P07339 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6574611 0.87 HDAC3 (0.41) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL542929 0.84 CA1 (0.39) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL1077918 0.82 HDAC3 (0.44) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL1361919 0.82 HDAC3 (0.48) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL29036681 0.81 HDAC3 (0.52) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219178 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219174 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL11256023 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219170 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219180 0.81 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117776546-A Anti-reflection glass 福美化学工业株式会社 2024-03-29 CN disclosed
CN-117425632-A Anti-reflection glass 福美化学工业株式会社 2024-01-19 CN disclosed
US-11773287-B2 Method for forming coating TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-03 US disclosed
US-20200369914-A1 METHOD FOR FORMING COATING TOKYO OHKA KOGYO CO., LTD. (JP) 2020-11-26 US disclosed
US-8450411-B2 Curable composition having a silane-modified reactive thinner HENKEL AG & CO. KGAA (DE) 2013-05-28 US disclosed
EP-2076568-B1 COMPOSITIONS CONSISTING OF PARTIALLY SILYL-TERMINATED POLYMERS HENKEL AG & CO KGAA (DE) 2012-05-23 EP disclosed
EP-2449033-A2 CURABLE COMPOSITION HAVING A SILANE-MODIFIED REACTIVE THINNER Henkel AG & Co. KGaA (DE) 2012-05-09 EP disclosed
US-20120108730-A1 CURABLE COMPOSITION HAVING A SILANE-MODIFIED REACTIVE THINNER HENKEL AG & CO. KGAA (DE) 2012-05-03 US disclosed
EP-2176315-B1 CURABLE COMPOSITIONS COMPOSED OF SILANES WITH TWO HYDROLYZABLE GROUPS HENKEL AG & CO KGAA (DE) 2011-03-30 EP disclosed
WO-2011000843-A2 CURABLE COMPOSITION HAVING A SILANE-MODIFIED REACTIVE THINNER HENKEL AG & CO. KGAA (DE) 2011-01-06 WO disclosed
WO-2010004038-A1 CURABLE COMPOSITIONS HENKEL AG & CO. KGAA (DE) 2010-01-14 WO disclosed
EP-2076568-A2 COMPOSITIONS CONSISTING OF PARTIALLY SILYL-TERMINATED POLYMERS Henkel AG & Co. KGaA (DE) 2009-07-08 EP disclosed
WO-2008043735-A2 COMPOSITIONS CONSISTING OF PARTIALLY SILYL-TERMINATED POLYMERS HENKEL AG & CO. KGAA (DE) 2008-04-17 WO disclosed