SCHEMBL10815035

SCHEMBL10815035

CCCCCCCC(CCO)(CCO)NC

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.44
ALDH1A1 P00352 2/20 0.44
HSD17B10 Q99714 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
TSHR P16473 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.40
GGPS1 O95749 6/20 0.38
FDPS P14324 9/20 0.36
EPHX1 P07099 1/20 0.36
CES2 O00748 1/20 0.35
LPAR1 Q92633 1/20 0.35
LPAR3 Q9UBY5 1/20 0.35
SMPD1 P17405 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2598044 1.00 LMNA (0.44) LMNAALDH1A1HSD17B10MEN1KMT2A
Hydrochloric Acid SCHEMBL6866773 0.98 LMNA (0.42) LMNAALDH1A1HSD17B10MEN1KMT2A
SCHEMBL5382076 0.89 TSHR (0.44) TSHRGGPS1FDPSEPHX1CES2
SCHEMBL2227498 0.89 TSHR (0.44) TSHRGGPS1FDPSEPHX1CES2
Hydrochloric Acid SCHEMBL3154978 0.88 HRH3 (0.45) ALDH1A1MEN1KMT2A
Hydrochloric Acid SCHEMBL31467545 0.86 TSHR (0.42) TSHRGGPS1FDPSEPHX1CES2
Hydrochloric Acid SCHEMBL27970377 0.86 TSHR (0.42) TSHRGGPS1FDPSEPHX1CES2
Hydrochloric Acid SCHEMBL31467543 0.86 TSHR (0.42) TSHRGGPS1FDPSEPHX1CES2
Hydrochloric Acid SCHEMBL22577656 0.86 TSHR (0.42) TSHRGGPS1FDPSEPHX1CES2
SCHEMBL8497514 0.84 LMNA (0.40) LMNAALDH1A1HSD17B10MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0118435-B1 IMPROVED POLYPHENYLENE ETHER RESIN COMPOSITIONS CONTAINING ANTISTATIC AGENTS GENERAL ELECTRIC COMPANY (US) 1987-12-09 EP disclosed
EP-0118435-A4 IMPROVED POLYPHENYLENE ETHER RESIN COMPOSITIONS CONTAINING ANTISTATIC AGENTS. GEN ELECTRIC (US) 1985-02-18 EP disclosed
EP-0118435-A1 IMPROVED POLYPHENYLENE ETHER RESIN COMPOSITIONS CONTAINING ANTISTATIC AGENTS. GEN ELECTRIC (US) 1984-09-19 EP disclosed
WO-1984001163-A1 IMPROVED POLYPHENYLENE ETHER RESIN COMPOSITIONS CONTAINING ANTISTATIC AGENTS GEN ELECTRIC (US) 1984-03-29 WO disclosed