⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14320285 | 0.73 | — | — | |
| SCHEMBL28960909 | 0.73 | — | — | |
| SCHEMBL478333 | 0.69 | ALDH1A1 (0.31) | — | |
| SCHEMBL8024288 | 0.69 | ALDH1A1 (0.31) | — | |
| SCHEMBL11028048 | 0.69 | — | — | |
| SCHEMBL5573241 | 0.69 | — | — | |
| SCHEMBL1052894 | 0.69 | — | — | |
| SCHEMBL10625852 | 0.69 | — | — | |
| SCHEMBL1532646 | 0.69 | — | — | |
| SCHEMBL6562983 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| WO-2010082710-A1 | METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2010-07-22 | — | — | WO | claimed |
| US-6410770-B2 | REDUCTION OF ALKOXYSILANE IN PRESENCE OF ALKALI METAL HYDRIDE AND HIGH BOILING SOLVENTS | GELEST, INC. | 2002-06-25 | — | — | US | claimed |
| US-20020002299-A1 | Chloride-free process for the production of alkylsilanes suitable for microelectronic applications | GELEST, INC. | 2002-01-03 | — | — | US | claimed |
| WO-2001058908-A2 | CHLORIDE-FREE PROCESS FOR THE PRODUCTION OF ALKYLSILANES SUITABLE FOR MICROELECTRONIC APPLICATIONS | GELEST, INC. (US) | 2001-08-16 | — | — | WO | claimed |
| JP-62022790-A | — | — | None | — | — | JP | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0657473-B1 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5608018-A | CONTAINING TRIVALENT TITANIUM COMPOUND MADE BY REDUCING A TETRAVALENT HYDROCARBYLOXYTITANIUM COMPOUND MIXED WITH ORGANOSILOXY COMPOUND AND ESTER BY MEANS OF ORGANOMAGNESIUM COMPOUND, ESTER-TREATING AND ETHER-TICL4-TREATING PRODUCT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-03-04 | — | — | US | disclosed |
| EP-0657473-A2 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-06-14 | — | — | EP | disclosed |
| EP-0259124-A2 | Method of polymerizing alpha olefins | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-03-09 | — | — | EP | disclosed |
| JP-S6222790-A | PRODUCTION OF TERTIARY HYDROCARBONSILYL COMPOUND | SHIN ETSU CHEM CO LTD | 1987-01-30 | — | — | JP | disclosed |