Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL126307 | 0.91 | ALDH1A1 (0.36) | ALDH1A1HTTNPSR1 | |
| SCHEMBL23493882 | 0.88 | CYP1A2 (0.34) | — | |
| SCHEMBL23494104 | 0.86 | — | — | |
| SCHEMBL4802507 | 0.84 | ALDH1A1 (0.33) | ALDH1A1HTTNPSR1 | |
| SCHEMBL1088117 | 0.77 | GLA (0.42) | ALDH1A1HTT | |
| SCHEMBL4085890 | 0.72 | ALDH1A1 (0.35) | ALDH1A1HTTNPSR1 | |
| SCHEMBL15515075 | 0.72 | — | — | |
| SCHEMBL152754 | 0.72 | ALDH1A1 (0.40) | ALDH1A1HTTNPSR1 | |
| SCHEMBL3766816 | 0.71 | ALDH1A1 (0.34) | ALDH1A1HTTNPSR1 | |
| Hydrochloric Acid SCHEMBL29812508 | 0.70 | PKM (0.39) | ALDH1A1HTTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-8153346-B2 | Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2012-04-10 | — | — | US | disclosed |
| WO-2008103776-A2 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-28 | — | — | WO | disclosed |
| US-20080206676-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC | 2008-08-28 | — | — | US | disclosed |
| US-7416821-B2 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2008-08-26 | — | — | US | disclosed |
| EP-1743363-A2 | THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION | FujiFilm Electronic Materials USA, Inc. (US) | 2007-01-17 | — | — | EP | disclosed |
| US-20050238997-A1 | Thermally cured undercoat for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. | 2005-10-27 | — | — | US | disclosed |
| WO-2005089150-A2 | THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS USA INC. (US) | 2005-09-29 | — | — | WO | disclosed |