⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1088645 | 0.77 | HSD17B10 (0.30) | — | |
| SCHEMBL668620 | 0.71 | HSD17B10 (0.32) | — | |
| SCHEMBL9577001 | 0.71 | — | — | |
| SCHEMBL313536 | 0.70 | MAPT (0.37) | — | |
| SCHEMBL1088169 | 0.70 | TP53 (0.31) | — | |
| SCHEMBL3430474 | 0.69 | HSD17B10 (0.37) | — | |
| SCHEMBL5804830 | 0.67 | HSD17B10 (0.36) | — | |
| SCHEMBL8772116 | 0.66 | — | — | |
| Formaldehyde SCHEMBL14736203 | 0.65 | — | — | |
| SCHEMBL3732341 | 0.65 | HSD17B10 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025128333-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128334-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250188312-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-8153346-B2 | Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2012-04-10 | — | — | US | disclosed |
| EP-2387735-A1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FujiFilm Electronic Materials USA, Inc. (US) | 2011-11-23 | — | — | EP | disclosed |
| US-8037621-B2 | Article of footwear including a woven strap system | NIKE, INC. (US) | 2011-10-18 | — | — | US | disclosed |
| EP-1163550-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2001-12-19 | — | — | EP | disclosed |
| US-6323287-B1 | USEFUL FOR AN UNDERCOAT LAYER IN DEEP ULTRAVILOLET RADIATION LITHOGRAPHY; FOR CHEMICALLY AMPLIFIED BILAYER RESIST SYSTEMS; SEMICONDUCTORS | ARCH SPECIALTY CHEMICALS, INC. | 2001-11-27 | — | — | US | disclosed |
| WO-2000054105-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | disclosed |
| US-5576163-A | FOR USE IN PHOTOGRAPHY, ELECTROSTATOGRAPHY AND THERMAL IMAGING | EASTMAN KODAK COMPANY (US) | 1996-11-19 | — | — | US | disclosed |
| EP-0530316-B1 | CROSS-LINKED CONDUCTIVE POLYMERS AND ANTISTAT LAYERS EMPLOYING THE SAME | EASTMAN KODAK CO (US) | 1995-01-25 | — | — | EP | disclosed |
| US-5318878-A | Cross-linked conductive polymers and antistat layers employing the same | EASTMAN KODAK COMPANY (US) | 1994-06-07 | — | — | US | disclosed |
| US-5198499-A | CROSS-LINKED POLYMERS FROM VINYL BENZENE SULFONATE SALTS, ETHYLENIC HYDROXY MONOMERS AND HYDROXYL CONTAINING BINDER POLYMERS | EASTMAN KODAK COMPANY (US) | 1993-03-30 | — | — | US | disclosed |
| EP-0530316-A1 | CROSS-LINKED CONDUCTIVE POLYMERS AND ANTISTAT LAYERS EMPLOYING THE SAME. | EASTMAN KODAK CO (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5096975-A | CROSS-LINKED POLYMERS FROM VINYL BENZENE SULFONATE SALTS AND ETHYLENIC HYDROXY MONOMERS | EASTMAN KODAK COMPANY (US) | 1992-03-17 | — | — | US | disclosed |
| WO-1991018061-A1 | CROSS-LINKED CONDUCTIVE POLYMERS AND ANTISTAT LAYERS EMPLOYING THE SAME | EASTMAN KODAK COMPANY (US) | 1991-11-28 | — | — | WO | disclosed |