SCHEMBL1089540

SCHEMBL1089540

CC1=C(C)C([Si](C)(C)NC(C)(C)C)C(C)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL4305780 0.96
Hydrochloric Acid SCHEMBL4305784 0.96
SCHEMBL9282363 0.94
SCHEMBL9285058 0.78 LMNA (0.30)
SCHEMBL22734185 0.77
SCHEMBL14324809 0.73
Hydrochloric Acid SCHEMBL8022568 0.72 GAA (0.30)
SCHEMBL7644297 0.72
SCHEMBL31290247 0.72
SCHEMBL1088797 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200388837-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH SILYL AMINE COMPOUNDS OR DERIVATIVES OF SILYL AMINE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-12-10 US claimed
US-11817578-B2 Silicon-based energy storage devices with silyl amine compounds or derivatives of silyl amine containing electrolyte additives ENEVATE CORPORATION (US) 2023-11-14 US disclosed
US-11817578-B2 Silicon-based energy storage devices with silyl amine compounds or derivatives of silyl amine containing electrolyte additives ENEVATE CORPORATION (US) 2023-11-14 US disclosed
US-11817578-B2 Silicon-based energy storage devices with silyl amine compounds or derivatives of silyl amine containing electrolyte additives ENEVATE CORPORATION (US) 2023-11-14 US disclosed
CN-113929808-A Composite optical fiber based on fluorescence detection system and preparation method thereof 杭州安誉科技有限公司 2022-01-14 CN disclosed
CN-113072657-A Composite optical fiber based on fluorescence detection system and preparation method thereof 杭州安誉科技有限公司 2021-07-06 CN disclosed
CN-107709383-B Process for the manufacture of polyolefins 陶氏环球技术有限责任公司 2021-03-30 CN disclosed
US-20200388837-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH SILYL AMINE COMPOUNDS OR DERIVATIVES OF SILYL AMINE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-12-10 US disclosed
US-20200388837-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH SILYL AMINE COMPOUNDS OR DERIVATIVES OF SILYL AMINE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2020-12-10 US disclosed
US-10465020-B2 Process for producing a polyolefin DOW GLOBAL TECHNOLOGIES LLC (US) 2019-11-05 US disclosed
US-20060102590-A1 METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY TOKYO ELECTRON LIMITED (JP) 2006-05-18 US disclosed
US-20060104831-A1 Method and system for cooling a pump TOKYO ELECTRON LIMITED 2006-05-18 US disclosed
US-20060102591-A1 Method and system for treating a substrate using a supercritical fluid TOKYO ELECTRON LIMITED 2006-05-18 US disclosed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US disclosed
US-20050191865-A1 Treatment of a dielectric layer using supercritical CO2 TOKYO ELECTRON LIMITED (JP) 2005-09-01 US disclosed
WO-2005038863-A2 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2005-04-28 WO disclosed
US-20050077597-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-04-14 US disclosed
US-6730756-B1 HETEROGENEOUS TRANSITION METAL CATALYST WITH METALLOCENE IMPREGNATED BOREALIS A/S (DK) 2004-05-04 US disclosed
EP-1137677-A2 CATALYST AND PROCESS FOR OLEFIN POLYMERIZATION BOREALIS A/S (DK) 2001-10-04 EP disclosed
WO-2000034341-A2 CATALYST AND PROCESS FOR OLEFIN POLYMERIZATION BOREALIS A/S (DK) 2000-06-15 WO disclosed