SCHEMBL10899068

SCHEMBL10899068

C=Cc1ccc(C(Cl)=CC(=O)O)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.42
▸ TDP1 Q9NUW8 2/20 0.38
▸ TAS1R3 Q7RTX0 3/20 0.38
▸ TAS1R1 Q7RTX1 3/20 0.38
▸ TSHR P16473 2/20 0.38
▸ KMT2A Q03164 1/20 0.33
▸ HDAC2 Q92769 1/20 0.33
▸ NR4A1 P22736 1/20 0.33
▸ NR4A2 P43354 1/20 0.33
▸ NR4A3 Q92570 1/20 0.33
▸ AKT1 P31749 1/20 0.32
▸ PSMD14 O00487 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ METAP1 P53582 1/20 0.32
▸ CA2 P00918 1/20 0.32
▸ POLB P06746 2/20 0.32
▸ HDAC1 Q13547 1/20 0.32
▸ GLA P06280 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ ALDH5A1 P51649 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1536421 0.77 NFE2L2 (0.46) ALDH1A1TDP1TSHRKMT2AAKT1
SCHEMBL1536420 0.77 NFE2L2 (0.46) ALDH1A1TDP1TSHRKMT2AAKT1
SCHEMBL362842 0.77 ALDH1A1 (0.52) ALDH1A1TDP1TAS1R3TAS1R1TSHR
SCHEMBL3809749 0.77 NFE2L2 (0.46) ALDH1A1TDP1TSHRKMT2AAKT1
SCHEMBL10594832 0.76 ALDH1A1 (0.52) ALDH1A1TDP1KMT2ALMNAHDAC1
SCHEMBL10594825 0.76 ALDH1A1 (0.52) ALDH1A1TDP1KMT2ALMNAHDAC1
SCHEMBL11806185 0.75 ALDH1A1 (0.50) ALDH1A1TDP1TAS1R3TAS1R1TSHR
SCHEMBL16536 0.74 ALDH1A1 (0.62) ALDH1A1TDP1TSHRKMT2AMETAP1
Acrylic Acid SCHEMBL10529438 0.74 ALDH1A1 (0.61) ALDH1A1TDP1TAS1R3TAS1R1TSHR
Acrylic Acid SCHEMBL28733841 0.74 ALDH1A1 (0.56) ALDH1A1TDP1TSHRKMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4591544-A Metal image forming materials with light sensitive resin layer and oblique angle deposited metal underlayer KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-05-27 — — US disclosed
EP-0082588-A2 Photolithographic elements for the production of metal images KONICA CORPORATION (JP) 1983-06-29 — — EP disclosed
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