SCHEMBL10919259

SCHEMBL10919259

O=C(O)C=Cc1ccccc1C=Cc1ccccc1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HCAR2 Q8TDS4 2/20 0.72
▸ HDAC3 O15379 2/20 0.72
▸ HDAC4 P56524 2/20 0.72
▸ HDAC1 Q13547 2/20 0.72
▸ HDAC2 Q92769 2/20 0.72
▸ HDAC8 Q9BY41 2/20 0.72
▸ HDAC6 Q9UBN7 2/20 0.72
▸ TNKS O95271 1/20 0.72
▸ HDAC7 Q8WUI4 1/20 0.72
▸ HDAC10 Q969S8 1/20 0.72
▸ HDAC11 Q96DB2 1/20 0.72
▸ TNKS2 Q9H2K2 1/20 0.72
▸ HDAC9 Q9UKV0 1/20 0.72
▸ HDAC5 Q9UQL6 1/20 0.72
▸ CA1 P00915 2/20 0.62
▸ CA2 P00918 2/20 0.62
▸ CA4 P22748 2/20 0.62
▸ NFKB1 P19838 1/20 0.62
▸ PTGER4 P35408 3/20 0.62
▸ PTGER3 P43115 3/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11121643 0.89 HCAR2 (0.75) HCAR2HDAC3HDAC4HDAC1HDAC2
SCHEMBL69543 0.89 NFKB1 (0.75) HCAR2HDAC3HDAC4HDAC1HDAC2
SCHEMBL459291 0.89 NFKB1 (0.75) HCAR2HDAC3HDAC4HDAC1HDAC2
SCHEMBL31197561 0.89 NFKB1 (0.75) HCAR2HDAC3HDAC4HDAC1HDAC2
SCHEMBL7167807 0.88 PLIN1 (0.72) HCAR2HDAC3HDAC4HDAC1HDAC2
(Z)-1,2-Diphenylethene SCHEMBL1079936 0.87 HCAR2 (0.95) HCAR2HDAC3HDAC4HDAC1HDAC2
(Z)-1,2-Diphenylethene SCHEMBL1079939 0.87 HCAR2 (0.95) HCAR2HDAC3HDAC4HDAC1HDAC2
Hydrochloric Acid SCHEMBL8374050 0.87 NFKB1 (0.72) HCAR2HDAC3HDAC4HDAC1HDAC2
Bromide SCHEMBL8376004 0.87 NFKB1 (0.72) HCAR2HDAC3HDAC4HDAC1HDAC2
SCHEMBL10747786 0.85 HDAC1 (0.91) HCAR2HDAC3HDAC4HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118584752-A POSS-based negative photoresist composition for organic insulating film 烟台希尔德材料科技有限公司 2024-09-03 — — CN claimed
CN-118584751-A POSS-based positive photoresist composition for organic insulating film 烟台希尔德材料科技有限公司 2024-09-03 — — CN claimed
CN-119144096-A Special material for high-flame-retardance temperature-resistant polyvinyl chloride foam material and preparation method thereof 新疆天创科技有限责任公司 2024-12-17 — — CN disclosed
CN-118584752-A POSS-based negative photoresist composition for organic insulating film 烟台希尔德材料科技有限公司 2024-09-03 — — CN disclosed
CN-118584751-A POSS-based positive photoresist composition for organic insulating film 烟台希尔德材料科技有限公司 2024-09-03 — — CN disclosed
CN-1272114-C Method for preparing super hydrophobic polymeric coating using non-crystalline polymer CHINESE ACAD INST CHEMISTRY (CN) 2006-08-30 — — CN disclosed
US-4581315-A COATING SUBSTRATE WITH IRRADIATION POLYMERIZABLE DIACETYLINIC CONJUGATED MATERIAL UNIVERSITY PATENTS, INC. (US) 1986-04-08 — — US disclosed
US-4439514-A Photoresistive compositions UNIVERSITY PATENTS, INC. (US) 1984-03-27 — — US disclosed
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