SCHEMBL10947653

SCHEMBL10947653

CCCCOCC=CC(N)=O

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.44
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
HCAR2 Q8TDS4 2/20 0.39
TSHR P16473 3/20 0.39
ALDH1A1 P00352 1/20 0.38
CES2 O00748 2/20 0.37
HPGD P15428 1/20 0.37
CYP3A4 P08684 2/20 0.36
MEN1 O00255 1/20 0.36
FAAH O00519 1/20 0.36
TP53 P04637 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C19 P33261 1/20 0.36
SOAT1 P35610 1/20 0.36
KMT2A Q03164 1/20 0.36
CNR1 P21554 1/20 0.34
RARB P10826 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28206555 0.88 MAPT (0.36) ATMMAPTRAB9ANPSR1HCAR2
SCHEMBL21160000 0.88 MAPT (0.36) ATMMAPTRAB9ANPSR1HCAR2
SCHEMBL30858680 0.83 ALDH1A1 (0.30) TSHRALDH1A1TP53
SCHEMBL809307 0.82 HCAR2 (0.53) ATMNPSR1HCAR2TSHRALDH1A1
SCHEMBL17884756 0.82 ATM (0.45) ATMMAPTRAB9ANPSR1HCAR2
SCHEMBL16368605 0.79
SCHEMBL2774564 0.79
SCHEMBL809395 0.79 ATM (0.68) ATMMAPTRAB9ANPSR1HCAR2
SCHEMBL712631 0.79 ATM (0.68) ATMMAPTRAB9ANPSR1HCAR2
SCHEMBL3980522 0.79 TSHR (0.32) NPSR1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109716566-A BINDER COMPOSITION FOR SECONDARY BATTERY, AND ELECTRODE FOR SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING SAME 株式会社LG化学 2019-05-03 CN claimed
EP-2346909-B1 POLYMERS DERIVED FROM N-VINYL FORMAMIDE, VINYL AMIDES OR ACRYLAMIDES, AND REACTION SOLVENT, AND THE USES THEREOF ISP INVESTMENTS INC (US) 2018-05-16 EP claimed
EP-4685230-A1 METHOD FOR PRODUCING NEURAL ORGANOIDS AND USE OF SAME KYOTO UNIVERSITY (JP) 2026-01-28 EP disclosed
WO-2025105395-A1 CELL CULTURE SUBSTRATE, METHOD FOR PRODUCING SAME, AND CELL CULTURE KIT 東ソー株式会社 2025-05-22 WO disclosed
WO-2024195789-A1 METHOD FOR PRODUCING NEURAL ORGANOIDS AND USE OF SAME 国立大学法人京都大学 2024-09-26 WO disclosed
US-20240218322-A1 CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME, METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELL, AND CELL CULTURE KIT TOSOH CORPORATION (JP) 2024-07-04 US disclosed
EP-4317407-A1 CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME, METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELL, AND CELL CULTURE KIT Tosoh Corporation (JP) 2024-02-07 EP disclosed
US-20230332102-A1 METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO ECTODERMAL, MESODERMAL, AND ENDODERMAL CELLS TOSOH CORPORATION (JP) 2023-10-19 US disclosed
EP-4180515-A1 METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO ECTODERMAL, MESODERMAL, AND ENDODERMAL CELLS Tosoh Corporation (JP) 2023-05-17 EP disclosed
CN-107177264-B Photo-thermal dual curable Insulation primer composition and its application 上海乘鹰新材料有限公司 2019-11-29 CN disclosed
CN-107216776-B A kind of photo-thermal dual curable composition of insulating coating and its application 上海维凯光电新材料有限公司 2019-11-22 CN disclosed
CN-107216776-A A kind of photo-thermal dual curable composition of insulating coating and its application 上海维凯光电新材料有限公司 2017-09-29 CN disclosed
CN-107177264-A Photo-thermal dual curable Insulation primer composition and its application 上海乘鹰新材料有限公司 2017-09-19 CN disclosed
EP-2690650-B1 LAMINATE FOR FORMING FINE PATTERN, AND METHOD FOR PRODUCING LAMINATE FOR FORMING FINE PATTERN ASAHI CHEMICAL IND (JP) 2017-08-09 EP disclosed
CN-106999628-A Hydrophobic acrylic acid's ester acrylamide copolymer for Ophthalmoligic instrument 诺华股份有限公司 2017-08-01 CN disclosed
WO-2017031400-A1 METHODS OF COATING AN ELECTRICALLY CONDUCTIVE SUBSTRATE AND RELATED ELECTRODEPOSITABLE COMPOSITIONS PPG INDUSTRIES OHIO, INC. (US) 2017-02-23 WO disclosed
US-9263649-B2 Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation ASAHI KASEI E-MATERIALS CORPORATION (JP) 2016-02-16 US disclosed
US-20140151733-A1 LAYERED PRODUCT FOR FINE PATTERN FORMATION AND METHOD OF MANUFACTURING LAYERED PRODUCT FOR FINE PATTERN FORMATION ASAHI KASEI KABUSHIKI KAISHA (JP) 2014-06-05 US disclosed
EP-2690650-A1 LAMINATE FOR FORMING FINE PATTERN, AND METHOD FOR PRODUCING LAMINATE FOR FORMING FINE PATTERN Asahi Kasei E-materials Corporation (JP) 2014-01-29 EP disclosed
US-4525499-A UNSATURATED POLYESTER AND VINYL RESIN DISPERSION STABILIZER DAI NIPPON TORYO CO., LTD. (JP) 1985-06-25 US disclosed