SCHEMBL109490

SCHEMBL109490

Cc1ccc(P(=O)(O)O)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.71
TSHR P16473 2/20 0.71
HPGD P15428 1/20 0.59
GAA P10253 3/20 0.56
CA2 P00918 1/20 0.55
CA4 P22748 1/20 0.55
CA5A P35218 1/20 0.55
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
MMP8 P22894 1/20 0.45
TDP1 Q9NUW8 2/20 0.44
ACHE P22303 2/20 0.44
ALDH1A1 P00352 4/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
CYP3A4 P08684 1/20 0.42
CES2 O00748 1/20 0.42
CES1 P23141 1/20 0.42
MAPT P10636 1/20 0.41
HTT P42858 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10917038 0.97 LMNA (0.68) LMNATSHRHPGDGAACA2
SCHEMBL28993824 0.97 LMNA (0.68) LMNATSHRHPGDGAACA2
SCHEMBL31514644 0.97 LMNA (0.68) LMNATSHRHPGDGAACA2
SCHEMBL11809603 0.93 LMNA (0.62) LMNATSHRHPGDGAACA2
Phenylphosphonic Acid SCHEMBL3820668 0.91 CA2 (0.73) LMNATSHRHPGDGAACA2
Phenylphosphonic Acid SCHEMBL28179373 0.87 CA2 (0.76) LMNATSHRHPGDGAACA2
Phenylphosphonic Acid SCHEMBL30500648 0.87 CA2 (0.76) LMNATSHRHPGDGAACA2
SCHEMBL31609287 0.87 TSHR (0.56) LMNATSHRHPGDGAACA2
SCHEMBL27395622 0.87 TSHR (0.56) LMNATSHRHPGDGAACA2
SCHEMBL2171752 0.85 CA2 (0.71) LMNATSHRHPGDGAACA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 880 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119912489-A Thorium phosphonate framework material, preparation method thereof and application thereof in thorium generator 中国科学院近代物理研究所 2025-05-02 CN claimed
CN-119186803-A Sorting method and system for ultrafine mineral fine mud 中国恩菲工程技术有限公司 2024-12-27 CN claimed
US-20240393684-A1 METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2024-11-28 US claimed
CN-119024654-A Method for forming pattern 三星SDI株式会社 2024-11-26 CN claimed
CN-118829715-A Bar compositions with enhanced antimicrobial activity 联合利华知识产权控股有限公司 2024-10-22 CN claimed
CN-118450886-A Liquid compositions with enhanced antimicrobial activity 联合利华知识产权控股有限公司 2024-08-06 CN claimed
WO-2023087996-A1 COMPOSITE FLAME-RETARDANT MATERIAL AND PREPARATION METHOD THEREFOR, SEPARATOR, NEGATIVE ELECTRODE PLATE, SECONDARY BATTERY, AND ELECTRIC DEVICE 宁德时代新能源科技股份有限公司 2023-05-25 WO claimed
CN-113845663-B Organic uranyl phosphonate crystalline state porous fluorescent material and preparation method and application thereof 南京理工大学 2023-05-05 CN claimed
CN-112852014-A Asymmetric organic aromatic ligand metal salt nucleating agent and preparation method and application thereof 华东理工大学 2021-05-28 CN claimed
CN-107592895-B Method of pumping an aqueous fluid containing a surface modifying treatment agent into a well 通用电气(GE)贝克休斯有限责任公司 2020-12-25 CN claimed
CN-1320135-A Catalyst for polyester production and process for process for producing polyester with the same TEIJIN LTD (JP) 2001-10-31 CN claimed
EP-1110988-A1 CATALYST FOR POLYESTER PRODUCTION AND PROCESS FOR PRODUCING POLYESTER WITH THE SAME TEIJIN LIMITED (JP) 2001-06-27 EP claimed
US-5854299-A Process for the polymerization of cyclic olefins and polymerizable composition CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-12-29 US claimed
US-5633111-A Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound FUJI PHOTO FILM CO., LTD. (JP) 1997-05-27 US claimed
EP-0722468-A1 PROCESS FOR THE POLYMERIZATION OF CYCLIC OLEFINS AND A POLYMERIZABLE COMPOSITION Ciba SC Holding AG (CH) 1996-07-24 EP claimed
WO-1995007310-A1 PROCESS FOR THE POLYMERIZATION OF CYCLIC OLEFINS AND A POLYMERIZABLE COMPOSITION CIBA-GEIGY AG (CH) 1995-03-16 WO claimed
US-5272035-A Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive FUJI PHOTO FILM CO., LTD. (JP) 1993-12-21 US claimed
US-5254430-A Lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1993-10-19 US claimed
US-5230988-A Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US claimed
EP-0133680-B1 METHOD OF PRODUCING COMPRESSION-MOULDED MATERIALS USING POLYISOCYANATE BINDING AGENTS CONTAINING LATENT, HEAT-ACTIVATABLE CATALYSTS BAYER AG (DE) 1988-04-27 EP claimed