SCHEMBL10959950

SCHEMBL10959950

O=C1C=CC(=O)C(c2ccc(-c3ccccc3)cc2)=C1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B3 P37058 1/20 1.00
▸ MAOA P21397 2/20 0.91
▸ MAOB P27338 2/20 0.91
▸ MAPK1 P28482 2/20 0.60
▸ KDM4E B2RXH2 1/20 0.60
▸ MEN1 O00255 1/20 0.60
▸ MAPT P10636 1/20 0.60
▸ PKM P14618 1/20 0.60
▸ KMT2A Q03164 1/20 0.60
▸ MCL1 Q07820 1/20 0.60
▸ TDP1 Q9NUW8 1/20 0.60
▸ BACE1 P56817 5/20 0.56
▸ PTPN1 P18031 2/20 0.55
▸ SETD7 Q8WTS6 5/20 0.51
▸ PTPRC P08575 2/20 0.48
▸ PTPRF P10586 1/20 0.48
▸ CDC25B P30305 1/20 0.48
▸ CCR6 P51684 1/20 0.41
▸ HKDC1 Q2TB90 1/20 0.41
▸ ALDH1A1 P00352 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26262 0.96 MAOA (1.00) HSD17B3MAOAMAOBMAPK1KDM4E
Bromide SCHEMBL27550712 0.93 MAOA (0.95) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL11329163 0.93 MAOA (0.95) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL28119480 0.93 MAOA (0.95) HSD17B3MAOAMAOBMAPK1KDM4E
Ethane SCHEMBL28553030 0.91 MAOA (0.91) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL27169536 0.89 HSD17B3 (0.78) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL27519851 0.88 MAOA (0.84) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL28028117 0.86 HSD17B3 (0.75) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL27547789 0.83 HSD17B3 (0.70) HSD17B3MAOAMAOBMAPK1KDM4E
SCHEMBL21887168 0.80 MAOA (0.72) HSD17B3MAOAMAOBMAPK1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117229309-A Triarylamine compound and organic electroluminescent device thereof 长春海谱润斯科技股份有限公司 2023-12-15 — — CN disclosed
CN-105524525-A RADIATION-CURABLE INK FOR INK JET RECORDING, RECORD MADE USING THE SAME, AND INK JET RECORDING METHOD USING THE SAME SEIKO EPSON CORP 2016-04-27 — — CN disclosed
CN-105348917-A Radiation curable ink jet composition, recorded matter, and ink jet recording method SEIKO EPSON CORP 2016-02-24 — — CN disclosed
CN-102604475-B Radiation-curable ink for inkjet, recorded matter, and inkjet recording method SEIKO EPSON CORP. (JP) 2016-02-17 — — CN disclosed
CN-105273491-A Photocurable ink composition, recording method, recording apparatus, photocurable ink jet recording ink composition, and ink jet recording method SEIKO EPSON CORP 2016-01-27 — — CN disclosed
CN-105273498-A Photocurable ink composition, recording method, recording apparatus, photocurable ink jet recording ink composition, and ink jet recording method SEIKO EPSON CORP 2016-01-27 — — CN disclosed
CN-102558958-B Radiation-curable ink composition for inkjet, recorded matter, and inkjet recording method SEIKO EPSON CORP. (JP) 2016-01-06 — — CN disclosed
CN-103547641-B Active energy ray-curable inkjet ink composition TOYO INK SC HOLDINGS CO.,LTD. (JP) 2015-12-23 — — CN disclosed
CN-102757693-B Photocurable ink composition, recording method and apparatus, photocurable ink composition for inkjet recording, and inkjet recording method SEIKO EPSON CORP. (JP) 2015-11-18 — — CN disclosed
CN-101370879-B Curable resin composition, surface protection method, temporary fixing method, and peeling method DENKI KAGAKU KOGYO KK 2015-06-24 — — CN disclosed
CN-101356204-A Photocurable resin composition DENKI KAGAKU KOGYO KK (JP) 2009-01-28 — — CN disclosed
CN-101103051-A Conductive polymer, conductive layer, electronic device, and electronic equipment SEIKO EPSON CORP (JP) 2008-01-09 — — CN disclosed
CN-101014585-A Radically polymerizable sulfur-containing compound and radically polymerizable sulfur-containing polymer SHOWA DENKO KK (JP) 2007-08-08 — — CN disclosed
CN-1938384-A Liquid composition containing hollow particles, method for producing same, and optical article JSR CORP (JP) 2007-03-28 — — CN disclosed
CN-1275932-C Polymerizable compound, polymerizable composition and cured product containing the compound SHOWA DENKO KK (JP) 2006-09-20 — — CN disclosed
CN-1533373-A Polymerizable compound, polymerizable composition containing the same, and cured product 昭和电工株式会社 2004-09-29 — — CN disclosed
CN-1101443-C Impregnation composition, and primer composition for resin concrete, method for its coating and composite body employing it DENKI KAGAKU KOGYO KK (JP) 2003-02-12 — — CN disclosed
CN-1067407-C Process for preparing phosphorus series flame-retardant unsaturated polyester FINANCIAL GROUP CORP IND TECH (CN) 2001-06-20 — — CN disclosed
CN-1164562-A Impregnation composition, and primer composition for resin concrete, method for its coating and composite body employing it DENKI KAGAKU KOGYO KK (JP) 1997-11-12 — — CN disclosed
US-4556671-A Pharmaceutical formulations BURROUGHS WELLCOME CO. (US) 1985-12-03 — — US disclosed
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