SCHEMBL10977516

SCHEMBL10977516

CCC1CC(=Cc2ccc(N)cc2)C(=O)C(=Cc2ccc(N)cc2)C1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.57
LMNA P02545 4/20 0.57
HTT P42858 3/20 0.57
ALDH1A1 P00352 3/20 0.57
HSP90AA1 P07900 2/20 0.57
RAB9A P51151 2/20 0.57
SMN1; SMN2 Q16637 1/20 0.57
MEN1 O00255 4/20 0.52
KMT2A Q03164 4/20 0.52
POLB P06746 2/20 0.52
RECQL P46063 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
NPC1 O15118 1/20 0.44
MAPK1 P28482 1/20 0.44
F2 P00734 7/20 0.43
F10 P00742 6/20 0.43
MAOB P27338 1/20 0.41
DRD3 P35462 1/20 0.40
CYP1A2 P05177 1/20 0.40
USP18 Q9UMW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10977512 1.00 MAPT (0.57) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL18415114 1.00 MAPT (0.57) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL10977689 0.88 MAPT (0.45) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL10979321 0.88 MAPT (0.45) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL11286592 0.84 MAPT (0.42) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL11286596 0.84 MAPT (0.42) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL17899550 0.84 MAPT (0.57) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL11289839 0.84 DRD3 (0.45) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL11289837 0.84 DRD3 (0.45) MAPTLMNAHTTALDH1A1HSP90AA1
SCHEMBL11282829 0.83 MAPT (0.44) MAPTLMNAHTTALDH1A1HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP claimed
US-4407927-A ANTIHALATION AGENT JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-04 US claimed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP claimed
CN-117756615-A Benzocyclobutene monomer capable of being cured at low temperature and having aggregation-induced emission effect, resin, preparation method and photoresist 中国科学院化学研究所 2024-03-26 CN disclosed
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP disclosed
US-4407927-A ANTIHALATION AGENT JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-04 US disclosed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP disclosed
US-4354976-A Process for the preparation of azidobenzal compounds MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1982-10-19 US disclosed