SCHEMBL10979321

SCHEMBL10979321

CCCC1C/C(=C/c2ccc(N)cc2)C(=O)/C(=C/c2ccc(N)cc2)C1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.45
HTT P42858 3/20 0.45
LMNA P02545 3/20 0.45
HSP90AA1 P07900 2/20 0.45
RAB9A P51151 2/20 0.45
ALDH1A1 P00352 2/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
DRD3 P35462 1/20 0.45
NPC1 O15118 1/20 0.42
MAPK1 P28482 1/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
POLB P06746 1/20 0.40
RECQL P46063 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
MAOB P27338 1/20 0.40
APP P05067 1/20 0.39
F2 P00734 7/20 0.39
F10 P00742 6/20 0.39
PLAU P00749 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10977689 1.00 MAPT (0.45) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL11289839 0.90 DRD3 (0.45) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL11289837 0.90 DRD3 (0.45) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL11286304 0.89 DRD3 (0.44) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL11286309 0.89 DRD3 (0.44) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL10977516 0.88 MAPT (0.57) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL10977512 0.88 MAPT (0.57) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL18415114 0.88 MAPT (0.57) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL10979246 0.82 CYP1A2 (0.57) MAPTHTTLMNAHSP90AA1RAB9A
SCHEMBL10978795 0.82 CYP1A2 (0.57) MAPTHTTLMNAHSP90AA1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP claimed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP claimed
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP disclosed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP disclosed
US-4354976-A Process for the preparation of azidobenzal compounds MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1982-10-19 US disclosed