SCHEMBL1099485

SCHEMBL1099485

CC(C)CCCCCP(=O)(O)O

nearest known ligand 0.56

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 3/20 0.56
LPAR2 Q9HBW0 1/20 0.56
ALDH1A1 P00352 2/20 0.56
TDP1 Q9NUW8 1/20 0.56
TYMS P04818 1/20 0.50
S1PR2 O95136 5/20 0.47
S1PR1 P21453 5/20 0.47
S1PR3 Q99500 5/20 0.47
S1PR4 O95977 4/20 0.47
FDPS P14324 3/20 0.45
BBOX1 O75936 2/20 0.43
LMNA P02545 1/20 0.42
CYP3A4 P08684 1/20 0.42
NFKB1 P19838 1/20 0.42
BLM P54132 1/20 0.42
PMP22 Q01453 1/20 0.42
ENPEP Q07075 1/20 0.42
LAP3 P28838 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1100638 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1100245 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1100896 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL15510572 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1101281 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1100677 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1100535 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL1100844 1.00 LPAR3 (0.56) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL19761997 0.98 ALDH1A1 (0.58) LPAR3LPAR2ALDH1A1TDP1TYMS
SCHEMBL700557 0.90 ALDH1A1 (0.67) LPAR3LPAR2ALDH1A1TDP1TYMS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120059733-A Novel copper halide-based luminescent material and preparation method and application thereof 浙江大学 2025-05-30 CN claimed
US-20240170294-A1 Silicon Etching Solution, Method for Treating Substrate, and Method for Manufacturing Silicon Device TOKUYAMA CORPORATION (JP) 2024-05-23 US claimed
CN-120059733-A Novel copper halide-based luminescent material and preparation method and application thereof 浙江大学 2025-05-30 CN disclosed
WO-2024204794-A1 ETCHING LIQUID FOR SILICON NITRIDES, METHOD FOR PROCESSING SUBSTRATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT 株式会社トクヤマ 2024-10-03 WO disclosed
US-20240170294-A1 Silicon Etching Solution, Method for Treating Substrate, and Method for Manufacturing Silicon Device TOKUYAMA CORPORATION (JP) 2024-05-23 US disclosed
CN-113334866-B Adhesive layer, optical film with adhesive layer, optical laminate, and image display device 日东电工株式会社 2023-04-07 CN disclosed
US-20210363391-A1 PRESSURE-SENSITIVE ADHESIVE LAYER, OPTICAL FILM HAVING PRESSURE-SENSITIVE ADHESIVE LAYER, OPTICAL LAMINATE, AND IMAGE DISPLAY DEVICE NITTO DENKO CORPORATION (JP) 2021-11-25 US disclosed
CN-111643926-B Extraction method based on magnetic Janus particles 清华大学 2021-11-12 CN disclosed
CN-113334866-A Adhesive layer, optical film with adhesive layer, optical laminate, and image display device 日东电工株式会社 2021-09-03 CN disclosed
CN-111500879-B Method for extracting rare earth elements based on magnetic Janus particles 清华大学 2021-07-27 CN disclosed
CN-110637069-B Adhesive layer, optical film with adhesive layer, optical laminate, and image display device 日东电工株式会社 2021-06-29 CN disclosed
US-20030118870-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2003-06-26 US disclosed
EP-0765913-B1 Process for the preparation of lactic acid-based polyester compositions DAINIPPON INK & CHEMICALS (JP) 2002-08-28 EP disclosed
US-20020018914-A1 Magnetic recording medium FUJIFILM HOLDINGS CORPORATION (JP) 2002-02-14 US disclosed
US-6169046-B1 ABSORBABLE BARRIER MEMBRANE FOR GUIDED TISSUE REGENERATION COMPRISING A LACTIC COPOLYESTER IN WHICH A POLYMERIZATION CATALYST IS DEACTIVATED DIRECTOR-GENERAL OF NATIONAL INSTITUTE FOR RESEARCH IN ORGANIC MATERIALS (JP) 2001-01-02 US disclosed
US-6110578-A STRUCTURAL UNIT DERIVED FROM HYDROXYCARBOXYLIC ACID, A STRUCTURAL UNIT DERIVED FROM MOLECULAR WEIGHT INCREASING AGENT AND/OR A STRUCTURAL UNIT DERIVED FROM POLYMERIZATION CATALYST DEACTIVATOR. DAINIPPON INK AND CHEMICALS, INC. (JP) 2000-08-29 US disclosed
US-6037384-A POLYLACTONE AND POLYMERIZATION CATALYST DEACTIVATOR; BIODEGRADABLE, STORAGE STABILITY, HEAT RESISTANCE, IMPACT STRENGTH, MOLDABILITY; PACKAGING, INSULATION, CUSHIONS DAINIPPON INK AND CHEMICALS, INC. (JP) 2000-03-14 US disclosed
US-5955529-A POLYESTER WITH UNITS FROM LACTIC ACID, DICARBOXYLIC ACIDS AND DIOLS; CALCIUM PHOSPHATE-BASED COMPOUND DAINIPPON INK AND CHEMICALS, INC. (JP) 1999-09-21 US disclosed
US-5686540-A Process for the preparation of lactic acid-based polyester DAINIPPON INK AND CHEMICALS, INC. (JP) 1997-11-11 US disclosed
EP-0765913-A1 Process for the preparation of lactic acid-based polyester compositions DAINIPPON INK AND CHEMICALS, INC. (JP) 1997-04-02 EP disclosed