SCHEMBL19761997

SCHEMBL19761997

CC(C)CCCCP(=O)(O)O

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
TDP1 Q9NUW8 1/20 0.58
TYMS P04818 1/20 0.52
LPAR3 Q9UBY5 3/20 0.52
LPAR2 Q9HBW0 1/20 0.52
BBOX1 O75936 2/20 0.44
LMNA P02545 2/20 0.44
CYP3A4 P08684 1/20 0.44
NFKB1 P19838 1/20 0.44
BLM P54132 1/20 0.44
PMP22 Q01453 1/20 0.44
S1PR2 O95136 5/20 0.44
S1PR1 P21453 5/20 0.44
S1PR3 Q99500 5/20 0.44
S1PR4 O95977 4/20 0.44
ENPEP Q07075 1/20 0.43
FDPS P14324 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1100896 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1100844 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL15510572 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1100535 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1100245 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1101281 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1099485 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1100677 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL1100638 0.98 LPAR3 (0.56) ALDH1A1TDP1TYMSLPAR3LPAR2
SCHEMBL700557 0.92 ALDH1A1 (0.67) ALDH1A1TDP1TYMSLPAR3LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240170294-A1 Silicon Etching Solution, Method for Treating Substrate, and Method for Manufacturing Silicon Device TOKUYAMA CORPORATION (JP) 2024-05-23 US claimed
WO-2024204794-A1 ETCHING LIQUID FOR SILICON NITRIDES, METHOD FOR PROCESSING SUBSTRATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT 株式会社トクヤマ 2024-10-03 WO disclosed
US-20240170294-A1 Silicon Etching Solution, Method for Treating Substrate, and Method for Manufacturing Silicon Device TOKUYAMA CORPORATION (JP) 2024-05-23 US disclosed
US-20230295457-A1 SURFACE TREATMENT LIQUID AND SURFACE TREATMENT METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-21 US disclosed
US-20180002312-A1 TETRA- AND PENTASUBSTITUTED BENZIMIDAZOLIUM COMPOUNDS USEFUL IN THE TREATMENT OF RESPIRATORY DISEASES BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2018-01-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180002312-A1 TETRA- AND PENTASUBSTITUTED BENZIMIDAZOLIUM COMPOUNDS USEFUL IN THE TREATMENT OF RESPIRATORY DISEASES H4C1; H4C2; H4C3; H4C4; H4C5; H4C6; H4C8; H4C9; H4C11; H4C12; H4C13; H4C14; H4C15; H4C16, F12, HRH4 ALDH1A1 1331/4885TDP1 2814/4885TYMS 133/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.