SCHEMBL1100899

SCHEMBL1100899

OCC1(CO)CCCC12CCC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1100181 0.94
SCHEMBL4122877 0.94 KDM4E (0.30)
SCHEMBL1100860 0.91
SCHEMBL1100546 0.85
SCHEMBL12858424 0.83
Methacrylic Acid SCHEMBL4121202 0.78 TGFBR1 (0.32)
SCHEMBL315369 0.76 KDM4E (0.33)
Methacrylic Acid SCHEMBL4123032 0.76 TGFBR1 (0.30)
Cyclohexane SCHEMBL10941428 0.73 ALDH1A1 (0.32)
Methacrylic Acid SCHEMBL4131297 0.72 TGFBR1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8889813-B2 Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium FUJIFILM CORPORATION (JP) 2014-11-18 US disclosed
US-20130184426-A1 MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2013-07-18 US disclosed
US-8415036-B2 Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium FUJIFILM CORPORATION (JP) 2013-04-09 US disclosed
US-8153283-B2 Magnetic recording medium, method of modifying surface of magnetic powder and magnetic coating material FUJIFILM CORPORATION (JP) 2012-04-10 US disclosed
US-20100273029-A1 MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2010-10-28 US disclosed
US-7737305-B2 Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium FUJIFILM CORPORATION (JP) 2010-06-15 US disclosed
US-7737304-B2 Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium FUJIFILM CORPORATION (JP) 2010-06-15 US disclosed
US-20090258254-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-10-15 US disclosed
US-20090246560-A1 MAGNETIC RECORDING MEDIUM, METHOD OF MODIFYING SURFACE OF MAGNETIC POWDER AND MAGNETIC COATING MATERIAL FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090142622-A1 MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-06-04 US disclosed
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090011285-A1 MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2009-01-08 US disclosed
US-20070020490-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2007-01-25 US disclosed
US-20060078711-A1 Magnetic recording medium and magnetic recording and reproducing method using the same FUJI PHOTO FILM CO., LTD. 2006-04-13 US disclosed
US-20050282040-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2005-12-22 US disclosed
US-6936328-B2 Magnetic recording medium FUJI PHOTO FILM CO., LTD. (JP) 2005-08-30 US disclosed
US-20030180578-A1 Magnetic recording medium FUJI PHOTO FILM CO., LTD. 2003-09-25 US disclosed