SCHEMBL1101017

SCHEMBL1101017

CC/C=C/CCCC(CCCC)OC(C)=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 3/20 0.42
ALDH1A1 P00352 2/20 0.40
FAAH O00519 1/20 0.40
MAPT P10636 1/20 0.40
HPGD P15428 1/20 0.40
CNR1 P21554 1/20 0.40
CNR2 P34972 1/20 0.40
CTSK P43235 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
F7 P08709 1/20 0.39
CYP19A1 P11511 1/20 0.39
F3 P13726 1/20 0.39
RXRA P19793 1/20 0.39
PTGS1 P23219 1/20 0.39
PPARG P37231 1/20 0.39
KMT2A Q03164 1/20 0.39
PPARD Q03181 1/20 0.39
PPARA Q07869 1/20 0.39
OXER1 Q8TDS5 1/20 0.39
NR1I2 O75469 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1101020 1.00 PRKCA (0.42) PRKCAALDH1A1FAAHMAPTHPGD
SCHEMBL832579 0.94 PRKCA (0.46) PRKCAF7F3OXER1GLS2
SCHEMBL833115 0.94 PRKCA (0.46) PRKCAF7F3OXER1GLS2
SCHEMBL833292 0.93 PRKCA (0.43) PRKCAALDH1A1FAAHMAPTHPGD
SCHEMBL5697322 0.90 FASN (0.39) PRKCACTSKPPARGKMT2AGLS2
SCHEMBL831893 0.90 FASN (0.39) PRKCACTSKPPARGKMT2AGLS2
SCHEMBL6430756 0.90 FASN (0.39) PRKCACTSKPPARGKMT2AGLS2
SCHEMBL832368 0.88 PRKCA (0.46) PRKCAALDH1A1FAAHMAPTHPGD
SCHEMBL8663020 0.88 ALDH1A1 (0.40) PRKCAALDH1A1MAPTHPGDCTSK
SCHEMBL4936618 0.87 ALDH1A1 (0.44) PRKCAALDH1A1FAAHMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US claimed
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO claimed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US claimed
US-8535872-B2 Thermally cured underlayer for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2013-09-17 US disclosed
US-20120178871-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION DE BINOD B (US) 2012-07-12 US disclosed
US-8153346-B2 Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2012-04-10 US disclosed
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US disclosed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US disclosed
US-20080206676-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC 2008-08-28 US disclosed
WO-2008103776-A2 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-28 WO disclosed