SCHEMBL1101050

SCHEMBL1101050

OCC12CCCCC3CC1CCC32CO

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
KDM4E B2RXH2 1/20 0.32
MAPT P10636 1/20 0.32
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL14919465 0.68
SCHEMBL7735127 0.67 TSHR (0.35) TSHRKDM4EMAPTHSD17B10
SCHEMBL5473307 0.67 TSHR (0.35) TSHRKDM4EMAPTHSD17B10
SCHEMBL16116930 0.66 CHRNB2 (0.33)
SCHEMBL27483884 0.65 TSHR (0.34) TSHRKDM4EMAPTHSD17B10
SCHEMBL1100808 0.65 HSD17B10 (0.37) TSHRKDM4EMAPTHSD17B10
SCHEMBL11863846 0.65 TSHR (0.34) TSHRKDM4EMAPTHSD17B10
SCHEMBL15535823 0.65 SCN9A (0.32)
SCHEMBL15105805 0.64
SCHEMBL15125268 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8889813-B2 Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium FUJIFILM CORPORATION (JP) 2014-11-18 US disclosed
US-20130184426-A1 MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2013-07-18 US disclosed
US-8415036-B2 Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium FUJIFILM CORPORATION (JP) 2013-04-09 US disclosed
US-8153283-B2 Magnetic recording medium, method of modifying surface of magnetic powder and magnetic coating material FUJIFILM CORPORATION (JP) 2012-04-10 US disclosed
US-20100273029-A1 MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2010-10-28 US disclosed
US-7737305-B2 Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium FUJIFILM CORPORATION (JP) 2010-06-15 US disclosed
US-7737304-B2 Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium FUJIFILM CORPORATION (JP) 2010-06-15 US disclosed
US-20090258254-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-10-15 US disclosed
US-20090246560-A1 MAGNETIC RECORDING MEDIUM, METHOD OF MODIFYING SURFACE OF MAGNETIC POWDER AND MAGNETIC COATING MATERIAL FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20060078711-A1 Magnetic recording medium and magnetic recording and reproducing method using the same FUJI PHOTO FILM CO., LTD. 2006-04-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090087687-A1 SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM ASH2L, ASIC1, HNRNPL TSHR 4287/4885KDM4E 2175/4885MAPT 2022/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.