SCHEMBL11029326

SCHEMBL11029326

CCC(NC(=O)C#N)=C(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1011842 0.77 FFAR3 (0.35)
SCHEMBL2780587 0.75 ALDH1A1 (0.33)
SCHEMBL2780583 0.75 ALDH1A1 (0.33)
SCHEMBL472247 0.74 CRBN (0.42)
SCHEMBL9013440 0.74 CRBN (0.42)
SCHEMBL8472102 0.72 ALDH1A1 (0.36)
SCHEMBL9317787 0.71 SMN1; SMN2 (0.31)
SCHEMBL844488 0.70 TDP1 (0.36)
SCHEMBL844490 0.70 TDP1 (0.36)
SCHEMBL8607585 0.69 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9482944-B2 Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates MYLAN GROUP (VN) 2016-11-01 US disclosed
US-20120190810-A1 COPOLYMERS, POLYMERIC PARTICLES COMPRISING SAID COPOLYMERS AND COPOLYMERIC BINDERS FOR RADIATION-SENSITIVE COATING COMPOSITIONS FOR NEGATIVE-WORKING RADIATION-SENSITIVE LITHOGRAPHIC PRINTING PLATES MYLAN GROUP (VN) 2012-07-26 US disclosed