SCHEMBL11049489

SCHEMBL11049489

O=c1c2ccccc2c(=O)c2c1c1ccccc1c1c(=O)c3ccccc3c(=O)c12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S100A4 P26447 1/20 0.48
ALDH1A1 P00352 4/20 0.42
MAOA P21397 4/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
HPGD P15428 3/20 0.42
KDM4E B2RXH2 3/20 0.42
MAPT P10636 3/20 0.42
GAA P10253 3/20 0.42
GLA P06280 2/20 0.42
HSD17B10 Q99714 2/20 0.42
HTT P42858 2/20 0.42
LMNA P02545 1/20 0.42
ATM Q13315 1/20 0.42
CYP3A4 P08684 1/20 0.42
PGAM1 P18669 1/20 0.42
CASP1 P29466 1/20 0.42
CASP7 P55210 1/20 0.42
POLB P06746 2/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20669045 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL30019620 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL29713419 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL29425353 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL5017301 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL25234735 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL470784 0.94 S100A4 (0.48) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL7905111 0.94 S100A4 (0.52) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL20669039 0.89 S100A4 (0.42) S100A4ALDH1A1MAOASMN1; SMN2HPGD
SCHEMBL20669047 0.88 S100A4 (0.45) S100A4ALDH1A1MAOASMN1; SMN2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4438245-A FOR LIGHT SENSITIVE ELEMENTS FUJI PHOTO FILM CO., LTD. (JP) 1984-03-20 US disclosed
US-4065430-A Functional group containing polymer and method of preparing the same FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4060685-A Furanacroyl esters FUJI PHOTO FILM CO., LTD. (JA) 1977-11-29 US disclosed
US-3993624-A Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam FUJI PHOTO FILM CO., LTD. (JA) 1976-11-23 US disclosed
US-3945831-A Photosensitive resins containing a thienylacrylic acid ester or amide group FUJI PHOTO FILM CO., LTD. (JA) 1976-03-23 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3933885-A Cinnamylideneacetic acid esters FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US disclosed