Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100A4 | P26447 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | MAOA | P21397 | 4/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | GAA | P10253 | 3/20 | 0.42 |
| ▸ | GLA | P06280 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | PGAM1 | P18669 | 1/20 | 0.42 |
| ▸ | CASP1 | P29466 | 1/20 | 0.42 |
| ▸ | CASP7 | P55210 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30019620 | 1.00 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL29425353 | 1.00 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL25234735 | 1.00 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL29713419 | 1.00 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL5017301 | 0.94 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL20669045 | 0.94 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL11049489 | 0.94 | S100A4 (0.48) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL7905111 | 0.94 | S100A4 (0.52) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL20669039 | 0.89 | S100A4 (0.42) | S100A4ALDH1A1MAOASMN1; SMN2HPGD | |
| SCHEMBL20669047 | 0.88 | S100A4 (0.45) | S100A4ALDH1A1MAOASMN1; SMN2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240062782-A1 | NONLINEAR LIGHT ABSORPTION MATERIAL, RECORDING MEDIUM, METHOD FOR RECORDING INFORMATION, AND METHOD FOR READING INFORMATION | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230203299-A1 | RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230203299-A1 | RESIST UNDERLAYER FILM- FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-2022244430-A1 | NONLINEAR LIGHT ABSORBING MATERIAL, RECORDING MEDIUM, METHOD FOR RECORDING INFORMATION, AND METHOD FOR READING INFORMATION | パナソニックＩＰマネジメント株式会社 | 2022-11-24 | — | — | WO | disclosed |
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2021-09-21 | — | — | US | disclosed |
| US-10615045-B2 | Composition for forming organic film, patterning process, and resin for forming organic film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-10444628-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-15 | — | — | US | disclosed |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2019-08-08 | — | — | US | disclosed |
| US-20190027369-A1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND RESIN FOR FORMING ORGANIC FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-24 | — | — | US | disclosed |
| EP-2714659-B1 | COMPOUNDS WITH OXIME ESTER AND/OR ACYL GROUPS | AMERICAN DYE SOURCE INC (CA) | 2017-07-05 | — | — | EP | disclosed |
| US-9127017-B2 | Compounds with oxime ester and/or acyl groups | AMERICAN DYE SOURCE, INC. (CA) | 2015-09-08 | — | — | US | disclosed |
| US-9127017-B2 | Compounds with oxime ester and/or acyl groups | AMERICAN DYE SOURCE, INC. (CA) | 2015-09-08 | — | — | US | disclosed |
| US-20140200350-A1 | COMPOUNDS WITH OXIME ESTER AND/OR ACYL GROUPS | AMERICAN DYE SOURCE, INC. (CA) | 2014-07-17 | — | — | US | disclosed |
| US-20140200350-A1 | COMPOUNDS WITH OXIME ESTER AND/OR ACYL GROUPS | AMERICAN DYE SOURCE, INC. (CA) | 2014-07-17 | — | — | US | disclosed |
| US-20140144509-A1 | Compounds for Organic Photovoltaic Devices | NOVALED AG (DE) | 2014-05-29 | — | — | US | disclosed |
| US-20140144509-A1 | Compounds for Organic Photovoltaic Devices | NOVALED AG (DE) | 2014-05-29 | — | — | US | disclosed |
| US-20140144509-A1 | Compounds for Organic Photovoltaic Devices | NOVALED AG (DE) | 2014-05-29 | — | — | US | disclosed |
| WO-2012159213-A1 | COMPOUNDS WITH OXIME ESTER AND/OR ACYL GROUPS | AMERICAN DYE SOURCE, INC. (CA) | 2012-11-29 | — | — | WO | disclosed |
| WO-2012110402-A1 | TRISAZO COMPOUNDS, PROCESSES FOR PREPARING THEM AND USE THEREOF | SENSIENT IMAGING TECHNOLOGIES GMBH (DE) | 2012-08-23 | — | — | WO | disclosed |
| WO-2012031735-A1 | COMPOUNDS FOR ORGANIC PHOTOVOLTAIC DEVICES | NOVALED AG (DE) | 2012-03-15 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | EMG1, FN1, TOP1 | S100A4 623/4885ALDH1A1 849/4885MAOA 714/4885 |
| US-10444628-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | CHRM1, OR10J3, MYB | S100A4 815/4885ALDH1A1 2205/4885MAOA 317/4885 |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | EMG1, FN1, TOP1 | S100A4 623/4885ALDH1A1 849/4885MAOA 714/4885 |
| US-20140200350-A1 | COMPOUNDS WITH OXIME ESTER AND/OR ACYL GROUPS | PPOX, SCO2, LPO | S100A4 2681/4885ALDH1A1 275/4885MAOA 65/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.