SCHEMBL11052178

SCHEMBL11052178

CCO/C(=N\C(C)C)NC(C)C

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.36
MGAM O43451 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 2/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
KDM4E B2RXH2 1/20 0.30
MEN1 O00255 1/20 0.30
GLA P06280 1/20 0.30
KMT2A Q03164 1/20 0.30
MAPT P10636 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11052184 1.00 GAA (0.36) GAAMGAMSIMGAM2SMN1; SMN2
SCHEMBL11792753 0.83 ALDH1A1 (0.38) ALDH1A1
SCHEMBL11792747 0.83 ALDH1A1 (0.38) ALDH1A1
SCHEMBL23451093 0.81 TSHR (0.32) SMN1; SMN2ALDH1A1
SCHEMBL11794881 0.81 ALDH1A1 (0.37) ALDH1A1
SCHEMBL10565859 0.80 ALDH1A1 (0.36) SMN1; SMN2ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL10565853 0.80 ALDH1A1 (0.36) SMN1; SMN2ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL9432212 0.78 ALDH1A1 (0.32) ALDH1A1
SCHEMBL11791538 0.77 NAAA (0.43) MEN1KMT2A
SCHEMBL11108083 0.77 NAAA (0.43) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4692940-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD Sumitomo Bakelite Co., Ltd. (JP) 2026-02-11 EP disclosed
US-12216113-B2 Method for preparing analysis sample, analysis method, and kit for preparing analysis sample SHIMADZU CORPORATION (JP) 2025-02-04 US disclosed
US-20240321803-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2024-09-26 US disclosed
US-20240272551-A1 NEGATIVE-TYPE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2024-08-15 US disclosed
WO-2022270529-A1 NEGATIVE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-12-29 WO disclosed
WO-2022270527-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE POLMER, CURED FILM AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-12-29 WO disclosed
WO-2022172988-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-08-18 WO disclosed
US-20210164989-A1 METHOD FOR PREPARING ANALYSIS SAMPLE, ANALYSIS METHOD, AND KIT FOR PREPARING ANALYSIS SAMPLE SHIMADZU CORPORATION (JP) 2021-06-03 US disclosed
EP-3812767-A1 METHOD FOR PREPARING ANALYSIS SAMPLE, ANALYSIS METHOD, AND KIT FOR PREPARING ANALYSIS SAMPLE SHIMADZU CORPORATION (JP) 2021-04-28 EP disclosed
US-4431576-A COSMETICS; TOILETRIES; DETERGENTS; INSECTICIDES; WAXES ROUSSEL UCLAF (FR) 1984-02-14 US disclosed
US-4406829-A ODORS, PERFUMES ROUSSEL UCLAF (FR) 1983-09-27 US disclosed
US-3947274-A Silver halide photographic material containing an isourea derivative as antifoggant FUJI PHOTO FILM CO., LTD. (JA) 1976-03-30 US disclosed